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Reaction pathways in atomistic models of thin film growth

机译:薄膜生长原子模型中的反应途径

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The atomistic processes that form the basis of thin film growth often involve complex multi-atom movements of atoms or groups of atoms on or close to the surface of a substrate. These transitions and their pathways are often difficult to predict in advance. By using an adaptive kinetic Monte Carlo (AKMC) approach, many complex mechanisms can be identified so that the growth processes can be understood and ultimately controlled. Here the AKMC technique is briefly described along with some special adaptions that can speed up the simulations when, for example, the transition barriers are small. Examples are given of such complex processes that occur in different material systems especially for the growth of metals and metallic oxides. (C) 2017 Author(s).
机译:形成薄膜生长基础的原子方法通常涉及在基板表面上或靠近基板表面上或靠近基板表面的复杂多原子运动。 这些过渡和它们的途径通常难以提前预测。 通过使用自适应动力学蒙特卡罗(AKMC)方法,可以识别许多复杂的机制,使得可以理解和最终控制生长过程。 这里简要描述AKMC技术以及例如,当过渡屏障小时可以加速模拟的一些特殊的特殊性。 给出了在不同材料系统中发生的这种复杂方法,特别是用于金属和金属氧化物的生长。 (c)2017年作者。

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