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Reactive oxygen and nitrogen species in Ar + N-2 thorn O-2 atmospheric-pressure nanosecond pulsed plasmas in contact with liquid

机译:AR + N-2刺耳型O-2大气压纳秒脉冲等离子体与液体接触的反应性氧和氮物质

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摘要

In this paper, a nanosecond pulse gas-liquid discharge is generated in Ar and Ar with admixtures of N-2 or O-2. The discharge images and waveforms of pulse voltage and discharge current are used to characterize gas-liquid discharge characteristics; optical emission spectroscopy and Fourier-transform infrared spectroscopy are employed to diagnose the reactive species in the gas phase, and chemical probe methods are employed to investigate plasma-induced reactive species (H2O2, NO2-, and NO3-) in the liquid phase. The effects of added contents of N-2 or O-2 in Ar discharge on the formation of reactive species are investigated. It is found that the productions of gaseous O and O-3 increase obviously with the increasing O-2 ratio and the productions of gaseous N-2 (C-B), NO, NO2, and N2O increase with the increasing N-2 ratio. Additionally, for the reactive species measured in the liquid phase, the increase in the N-2 ratio in Ar discharge is beneficial for increasing the concentrations of NO3- and NO2- and decreasing the concentrations of H2O2, while the increase in the O-2 ratio in Ar discharge decreases the concentrations of H2O2 and inhibits the production of NO2-. Published under license by AIP Publishing.
机译:在本文中,在AR和AR中产生纳秒脉冲气液排放,其含有N-2或O-2的混合物。脉冲电压和放电电流的放电图像和波形用于表征气液排放特性;使用光学发射光谱和傅立叶变换红外光谱法诊断气相中的反应物质,使用化学探针方法在液相中研究血浆诱导的反应性物质(H 2 O 2,NO 2和NO 3)。研究了N-2或O-2在Ar排出的添加含量对反应性物质形成的影响。发现气态O和O-3的制造显然随着O-2(C-B),NO,NO 2的增加而增加,随着N-2比的增加而增加,N-2(C-B),NO 2和N2O增加。另外,对于在液相中测量的反应性物质,Ar放电中的N-2比的增加是有益的,用于增加NO 3和NO 2的浓度并降低H2O2的浓度,而O-2的增加Ar放电中的比率降低了H 2 O 2的浓度,并抑制NO 2的产生。通过AIP发布在许可证下发布。

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  • 来源
    《Physics of plasmas》 |2019年第2期|共9页
  • 作者单位

    Dalian Univ Technol Minist Educ Key Lab Mat Modificat Dalian 116024 Peoples R China;

    Dalian Univ Technol Minist Educ Key Lab Mat Modificat Dalian 116024 Peoples R China;

    Dalian Univ Technol Minist Educ Key Lab Mat Modificat Dalian 116024 Peoples R China;

    Dalian Univ Technol Minist Educ Key Lab Mat Modificat Dalian 116024 Peoples R China;

    Dalian Univ Technol Minist Educ Key Lab Mat Modificat Dalian 116024 Peoples R China;

    Dalian Univ Technol Minist Educ Key Lab Mat Modificat Dalian 116024 Peoples R China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 等离子体物理学;
  • 关键词

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