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Conversion of spin current into charge current in a topological insulator: Role of the interface

机译:将旋转电流转换为拓扑绝缘体中的充电电流:界面的作用

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Three-dimensional spin current density injected onto the surface of a topological insulator (TI) produces a two-dimensional charge current density on the surface of the TI, which is the so-called inverse Edelstein effect (IEE). The ratio of the surface charge current density on the TI to the spin current density injected across the interface defined as the IEE length was shown to be exactly equal to the mean free path in the TI determined to be independent of the electron transmission rate across the interface [Phys. Rev. B 94, 184423 (2016)]. However, we find that the transmission rate across the interface gives a nonzero contribution to the transport relaxation rate in the TI as well as to the effective IEE relaxation rate (over and above any surface hybridization effects), and the IEE length is always less than the original mean free path in the TI without the interface. We show that both the IEE relaxation time and the transport relaxation time in the TI are modified by the interface transmission time. The correction becomes significant when the transmission time across the interface becomes comparable to or less than the original momentum scattering time in the TI. This correction is similar to experimental results in Rashba electron systems in which the IEE relaxation time was found shorter in the case of direct interface with metal in which the interface transmission rate will be much higher, compared to interfaces incorporating insulating oxides. Our results indicate the continued importance of the interface to obtain a better spin-to-charge current conversion and a limitation to the conversion efficiency due to the quality of the interface.
机译:注射到拓扑绝缘体(TI)的表面的三维自旋电流密度产生TI,这就是所谓的逆埃德尔斯坦效应(IEE)的表面上的二维电荷电流密度。在TI跨定义为IEE长度的界面注入的自旋电流密度表面充电电流密度的比率被证明是完全等于在TI的平均自由路径确定为独立穿过电子传输速率的接口[物理学。版本B 94,184423(2016)]。然而,我们发现,通过接口的传输速率给出了TI,以及对有效IEE松弛率(超过和上述任何表面杂交效应)到输送松弛率非零贡献,并且IEE长度总是小于在TI原有的平均自由程没有接口。我们发现,无论是IEE弛豫时间,并在TI运输弛豫时间由接口传输时间修改。当跨越接口的发送时间变为相当于或小于在TI原始动量散射时间的校正变得显著。这种校正是类似于拉什巴电子系统的实验结果,其中,IEE弛豫时间被发现在与金属直接接口的情况下更短,其中所述接口的传输速率将是更高的,相比掺入绝缘氧化物接口。我们的研究结果表明,由于界面的质量的接口,以获得更好的自旋荷电流转换和限制转换效率的持续重要性。

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