X-ray contact microscopic imaging in keV spectral region using laser-produced plasmas

摘要

We report here contact microscopic imaging in keV spectral region using pulsed X-ray emission from laser-produced plasmas, The X-ray source was produced by focusing single laser pulses of second harmonic of Nd:glass laser with a peak power of 3 GW in 3 nS (FWHM) on planar targets of copper. Single shot X-ray images of 1:1 magnification and an estimated spatial resolution similar to 120 nm were obtained on a ERP-40 photoresist-coated silicon wafer. These images were subsequently viewed under scanning electron microscope and atomic force microscope for high magnification, and with a differential interference contrast optical microscope for colour contrast, Details of the imaging technique are presented, and images recorded for yeast cells are given as an example. [References: 9]