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首页> 外文期刊>Electrochimica Acta >The effect of chloride ions on the electrochemical dissolution of chalcopyrite in sulfuric acid solutions
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The effect of chloride ions on the electrochemical dissolution of chalcopyrite in sulfuric acid solutions

机译:氯离子对硫酸溶液中硫代铜矿电化学溶出的影响

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AbstractThe dissolution of chalcopyrite in 0.2M sulfuric acid solutions with different sodium chloride concentrations was investigated. Different anodic potentials were applied, and the behavior of the electrode was observed using potentiodynamic, cyclic voltammetry (CV), and electrochemical impedance spectroscopy (EIS) techniques. The results showed that the chalcopyrite open circuit potential (OCP, approximately 245mV vs. SCE) decreased as the NaCl concentration increased. Four different surface conditions emerged on the chalcopyrite surface as the anodic potentials increased: (1) a Cu1?xFe1?yS2passive layer formed at OCP–500mV; (2) a second passive layer (Cu1?x-zS2) formed at 500–700mV (electrolyte without NaCl) or 500–800mV (electrolyte with NaCl); and (3) chalcopyrite was in an active area at 700–800mV (electrolyte without NaCl) or 800–900mV (electrolyte with NaCl), and all the previous passive layers disappeared. In this case, SO42?or S2O32?and S4O62?for the electrolyte without NaCl or with NaCl, respectively, are the oxidized forms of sulfide sulfur; (4) when the potential is above 800mV (for the electrolyte without NaCl) or 900mV (for the electrolyte with NaCl), pseudo-passive CuS is formed. Subsequently, the sulfur of CuS was oxidized to SO42?, and Cu2+changed into CuCl+with a NaCl concentration of 0mol/L and 0.5mol/L, respectively. However, a new passive layer(s) of Cu2(OH)3Cl formed with NaCl concentrations above 0.5mol/L. Overall, the results revealed that Clions are advantageous for chalcopyrite dissolution. However, the oxidation of chalcopyrite generated chloride and cupric ions that can form the cuprous complexes CuCl0, CuCl2or CuCl32?, which dramatically inhibit the on-going dissolution of chalcopyrite. EIS data confirmed that a high concentration of Clions was not essential for chalcopyrite dissolution under the present conditions. Moreover, the critical Clion concentrations were different for the four distinct potential areas outlined above, namely, 1.0mol/L, 1.25mol/L, 1.25mol/L and 0.5mol/L, respectively.]]>
机译:<![cdata [ 抽象 研究了用不同氯化钠浓度的0.2M硫酸溶液中的核黄素溶解。施加不同的阳极电位,使用电位动力学,环状伏安法(CV)和电化学阻抗光谱(EIS)技术观察电极的行为。结果表明,随着NaCl浓度的增加,黄铜矿开路电位(OCP,约245mV与SCE)降低。阳极电位增加四个不同的表面条件随着阳极电位增加:(1)CU 1?X FE 1?Y S 2 在OCP-500MV处形成的无源层; (2)第二无源层(CU 1?XZ S 2 ),形成为500 -700mV(无NaCl的电解质)或500-800mV(用NaCl电解质); (3)黄铜矿在700-800mV(无NaCl的电解质)的活性面积中或800-900mV(用NaCl电解质),并且所有先前的被动层消失了。在这种情况下,所以 4 2?或s 2 O 3 2?和S 4 O 6 2?对于没有NaCl或用NaCl的电解质,分别是氧化形式的硫化物硫; (4)当电位高于800mV时(对于没有NaCl的电解质)或900mV(用于用NaCl的电解质),形成伪无源CU。随后,将CU的硫氧化为SO 4 2?,以及CU 2 + 改为cucl + ,NaCl浓度为0mol / l和0.5mol / l,分别。但是,Cu 2 (ob) 3 cl形成NaCl浓度高于0.5mol / L.总的来说,结果表明,CL 离子对黄铜矿溶解是有利的。然而,氯化物氧化氯化物产生的氯化物和铜离子,其可以形成亚富铬络合物CuCl 0 ,CuCl 2 或cucl 3 2?,显着抑制了黄铜矿的正在进行的溶解。 EIS数据证实,高浓度的Cl β离子对本条件下的黄铜矿溶解不是必需的。此外,关键CL β离子浓度对于上述四个不同的潜在区域不同,即1.0mol / L,1.25mol / L,1.25mol / l和0.5mol / l分别。 ]]>

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