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Influence of water content and applied potential on the electrodeposition of Ni coatings from deep eutectic solvents

机译:水含量对深层共晶溶剂涂层电沉积的影响

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Ni coatings were electrodeposited from 1:2 choline chloride (ChCl) - urea (U) deep eutectic solvents (DESs) on low carbon steel. We report on the inter-related influence of water content in the electrolyte and applied potential on the formation of Ni films and their chemical composition and morphology. This was investigated by cyclic voltammetry (CV) and chronoamperometry (CA) in combination with ex-situ characterization techniques (FE-SEM, EDS, XPS and Raman spectroscopy). Ni electrodeposition from DES is shown to be highly complex: Ni+2 reduction is followed by water reduction, which triggers electrolyte decomposition. A water content higher than 4.5%wt and/or performing electrodeposition at potentials more negative than E = -0.90V vs Ag quasi-reference electrode enhances the decomposition of the solvent. This breakdown appears via either an electrochemical reaction or triggered by water splitting. In both cases, it leads to the incorporation of DESs decomposition products, such as trimethylamine and acetaldehyde within the Ni film. Under these conditions, the films are composed of metallic Ni and NiOx(OH)(2(1-x)). (C) 2019 Elsevier Ltd. All rights reserved.
机译:镍镀层从1电沉积:2氯化胆碱(CHCL) - 脲(U)上的低碳钢深共晶的溶剂(DESS)。我们对在电解质中的水含量的相互关联影响报告,并在Ni膜的形成和它们的化学组成和形态应用潜力。这是通过与易地表征技术(FE-SEM,EDS,XPS和拉曼光谱)联合循环伏安法(CV)和计时(CA)的影响。从DES的Ni电沉积被示为高度复杂的:镍+ 2还原,随后还原水,这将触发电解质分解。在电势更负A的水含量高于4.5%(重量)和/或进行电沉积大于E = -0.90V相对于Ag准参考电极提高了溶剂的分解。此击穿经由任一电化学反应出现或通过水裂解触发。在两种情况下,它会导致的分解DESS产品,如Ni膜中三甲胺和乙醛的并入。在这些条件下,所述膜由金属Ni和NIOX(OH)(2(1-X))的。 (c)2019 Elsevier Ltd.保留所有权利。

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