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Thin-layered surface depth profiling by using dc voltage modulation technique in glow discharge optical emission spectrometry (GD-OES)

机译:辉光放电光发射光谱法(GD-OES)中使用直流电压调制技术的薄层表面深度剖析

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摘要

Up to now, glow discharge optical emission spectrometry has been applied as a very useful method for a bulk analysis of conducting or non-conducting solid samples. Recently, a number of glow discharge users begin to interest in the analysis of thin-layered materials by using glow discharge optical emission and mass spectrometry. The dc voltage modulation technique has been used for analysis of trace elements in the steel samples with a good precision and sensitivity. Conventional glow discharge plasma can be easily modulated by means of superimposing of an alternating voltage on the dc bias voltage. The intensity of emitted light will be varied according to the applied alternating component, so that only the modulated component can be detected selectively by using a lock-in amplifier. In this study we had some parametric studies on emission characteristics of the dc voltage modulation glow discharge plasma, and then we measured a depth profile of a 100-nm-order of Ni-electroplated steel sample, and some favorable results were obtained.
机译:到目前为止,辉光放电光发射光谱法已被用作对导电或不导电固体样品进行大量分析的非常有用的方法。近来,许多辉光放电用户开始通过使用辉光放电光发射和质谱法来分析薄层材料。直流电压调制技术已用于分析钢样品中的痕量元素,具有良好的精度和灵敏度。常规的辉光放电等离子体可以通过在直流偏置电压上叠加交流电压来轻松调制。发射光的强度将根据所施加的交替分量而变化,从而通过使用锁定放大器可以选择性地仅检测调制分量。在这项研究中,我们对直流电压调制辉光放电等离子体的发射特性进行了一些参数研究,然后测量了100纳米数量级的镍电镀钢样品的深度分布,并获得了一些满意的结果。

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