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Fast joining SiC ceramics with Ti3SiC2 tape film by electric field-assisted sintering technology

机译:电场辅助烧结技术将SiC陶瓷与Ti3SiC2带膜快速结合

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摘要

Commercial SiC ceramics were joined by electric field-assisted sintering technology using a Ti3SiC2 (TSC) tape film. A SiC/TSC/SiC joining sample with bend strength of 80.4 MPa was obtained at a low joining temperature of 1300 degrees C within a total time of 15 min. Three simple failure mechanism models were established, and the failure mechanisms of the joints joined at different temperatures were then revealed. The element diffusion and phase transition behaviour in the joining interface were investigated. (C) 2015 Elsevier B.V. All rights reserved.
机译:使用Ti3SiC2(TSC)胶带薄膜通过电场辅助烧结技术将商用SiC陶瓷连接起来。在15分钟的总时间内,在1300摄氏度的低接合温度下获得了具有80.4 MPa弯曲强度的SiC / TSC / SiC接合样品。建立了三种简单的失效机理模型,揭示了不同温度下接头的失效机理。研究了连接界面中元素的扩散和相变行为。 (C)2015 Elsevier B.V.保留所有权利。

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