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首页> 外文期刊>Journal of nanoscience and nanotechnology >Back-Ground Current Error Compensation for Measurement of Ultra-High Resistance Nano Films' Insulation Characteristics
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Back-Ground Current Error Compensation for Measurement of Ultra-High Resistance Nano Films' Insulation Characteristics

机译:用于测量超高电阻纳米膜绝缘特性的背景电流误差补偿

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Ultra-high resistance measurement is of great importance in performance test for nano dielectric films. Time-varying nonlinear background current is usually an excess current across the device under test, which makes normal standard test method inaccurate. A novel back-ground current error compensation method is proposed in this study report to reduce this effect. Nth order non-linear background current model was firstly established and then measurement formulation derived from n + 2 groups of observed electrometer output signals by applying high test voltage with alternating polarity. Two compensation algorithms were introduced according to the background current mechanism, to obtain actual current from DUT without background current terms. Results from the experiments showed that measurement uncertainty (k = 2) of 100 CR Nano Film was lower than +/-3.5% with 100 V testing voltage. Meanwhile, the measurement settling time caused by intrinsic dielectric dissipation was shortened from 30 minutes to 4 minutes. The insulation tests demonstrated that this method can improve the accuracy and enlarge test range for ultra-high resistance Nano Films measurement.
机译:超高电阻测量在纳米介电膜的性能测试中非常重要。时变非线性本底电流通常是被测器件两端的过电流,这使得正常的标准测试方法不准确。本研究报告提出了一种新颖的背景电流误差补偿方法,以减小这种影响。首先建立N阶非线性本底电流模型,然后通过施加具有交替极性的高测试电压,从n + 2组观察到的静电计输出信号中得出测量公式。根据背景电流机制,引入了两种补偿算法,以在没有背景电流项的情况下从DUT获得实际电流。实验结果表明,在100 V测试电压下,100 CR纳米膜的测量不确定度(k = 2)低于+/- 3.5%。同时,由固有电介质耗散引起的测量建立时间从30分钟缩短到4分钟。绝缘测试表明,该方法可提高超高电阻纳米膜测量的准确性并扩大测试范围。

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