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首页> 外文期刊>Journal of Materials Science >Enlargement of diatom frustules pores by hydrofluoric acid etching at room temperature
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Enlargement of diatom frustules pores by hydrofluoric acid etching at room temperature

机译:在室温下通过氢氟酸蚀刻使硅藻壳孔扩大

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Based on the fact that SiO_2 can dissolve in HF solution, three kinds of diatom frustules were treated with 1% HF solution at room temperature. Given the proper reaction times (0-2 h for the diatoms Coscinodiscus and Navicula, and 0-3 h for the diatom Melosira), the size of the pores on the frustules gradually increased and the structures of the frustules remained. While HF treatment does not affect the composition, chemical bonds, or photoluminescence signature of the diatom frustules, the treatment reduces their surface areas. This method may be beneficial to diatom studies, diatom nanotechnology, and diatom device applications that make use of diatom pores.
机译:基于SiO_2可以溶解在HF溶液中这一事实,在室温下用1%的HF溶液处理了三种硅藻壳。给定适当的反应时间(硅藻Coscinodiscus和Navicula为0-2 h,硅藻Melosira为0-3 h),壳上孔的大小逐渐增加,并且壳的结构保持不变。尽管HF处理不影响硅藻壳的组成,化学键或硅谷壳的光致发光特征,但该处理可减小其表面积。该方法可能有益于硅藻研究,硅藻纳米技术以及利用硅藻孔的硅藻装置应用。

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