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Synthesis and characterization of high surface area silicon carbide by dynamic vacuum carbothermal reduction

机译:动态真空碳热还原法合成高表面积碳化硅及其表征

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摘要

Silicon carbide (SiC) precursor was obtained by sol-gel used tetraethoxysilane as silicon source and saccharose as carbon source, and then the precursor was used to prepare SiC by carbothermal reduction under dynamic vacuum condition. The samples were characterized by X-ray diffraction, scanning electron microscope, and low-temperature nitrogen adsorption-desorption measurement. The results showed that the carbothermal temperature for synthesizing SiC needed to be at 1,100 degrees C under dynamic vacuum. At this temperature, the obtained sample is composed of agglomerated regular grains with size ranging from 20 to 40 nm and has a high surface area of 167 m(2)/g and the main pore size center at 5.3 nm.
机译:以四乙氧基硅烷为硅源,蔗糖为碳源,通过溶胶-凝胶法得到碳化硅(SiC)前驱体,然后在动态真空条件下,通过碳热还原法制备碳化硅。通过X射线衍射,扫描电子显微镜和低温氮吸附-脱附测量来表征样品。结果表明,在动态真空下,合成SiC的碳热温度需要在1100℃。在此温度下,所获得的样品由尺寸为20至40 nm的附聚规则晶粒组成,具有167 m(2)/ g的高表面积,主孔尺寸中心位于5.3 nm。

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