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Preparation of MTMS based transparent superhydrophobic silica films by sol-gel method

机译:溶胶-凝胶法制备基于MTMS的透明超疏水二氧化硅薄膜

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Superhydrophobic surfaces with water contact angle higher than 150 degrees generated a lot of interest both in academia and in industry because of the self-cleaning properties. Optically transparent superhydrophobic silica films were synthesized at room temperature (27 degrees C) using sol-gel process by a simple dip coating technique. The molar ratio of MTMS:MeOH:H2O (5 M NH4OH) was kept constant at 1:10.56:4.16, respectively. Ernphasis is given to the effect of the surface modifying agents on the hydrophobic behavior of the films. Methyl groups were introduced in the silica film by post-synthesis grafting from two solutions using trimethylchlorosilane (TMCS) and hexamethyldisilazane (HMDZ) silylating agents in hexane solvent, individually. The percentage of silylating agents and silylation period was varied from 2.5 to 7.5% and 1 to 3 h, respectively. The TMCS modified films exhibited a very high water contact angle (166 +/- 2 degrees) in comparison to the HMDZ (138 +/- 2 degrees) modified films, indicating the water repellent behavior of the surface. When the TMCS and HMDZ modified films were heated at temperatures higher than 350 degrees C and 335 degrees C, respectively, the films became superhydrophilic; the contact angle for water on the films was smaller than 5 degrees. Further, the humidity study was carried out at a relative humidity of 85% at 30 degrees C temperature over 30 days. The films have been characterized by scanning electron microscopy (SEM), atomic force microscopy (AFM), Fourier transform infrared spectroscopy (FT-IR), % optical transmission, humidity tests and contact angle (CA) measurements. (C) 2009 Elsevier Inc. All rights reserved.
机译:水接触角大于150度的超疏水表面由于具有自清洁特性,因此在学术界和工业界都引起了广泛的关注。通过简单的浸涂技术,使用溶胶-凝胶法在室温(27℃)下合成光学透明的超疏水二氧化硅膜。 MTMS:MeOH:H2O(5 M NH4OH)的摩尔比分别保持恒定在1:10.56:4.16。着重指出了表面改性剂对薄膜疏水性能的影响。通过在己烷溶剂中分别使用三甲基氯硅烷(TMCS)和六甲基二硅氮烷(HMDZ)甲硅烷基化剂从两种溶液中进行合成后接枝,将甲基引入二氧化硅膜中。甲硅烷基化剂的百分比和甲硅烷基化时间分别为2.5至7.5%和1至3小时。与HMDZ(138 +/- 2度)改性膜相比,TMCS改性的膜表现出非常高的水接触角(166 +/- 2度),表明表面具有疏水性。当分别在高于350℃和335℃的温度下加热TMCS和HMDZ改性膜时,这些膜变得超亲水。膜上水的接触角小于5度。此外,湿度研究是在30℃,相对湿度为85%的条件下进行30天。通过扫描电子显微镜(SEM),原子力显微镜(AFM),傅里叶变换红外光谱(FT-IR),透光率,湿度测试和接触角(CA)测量来表征薄膜。 (C)2009 Elsevier Inc.保留所有权利。

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