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Structures and dielectric properties of pyrochlore bismuth zinc niobate thin films with zinc compensation

机译:具有锌补偿的烧绿石铋铌酸锌薄膜的结构和介电性能

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摘要

Pyrochlore Bi_(1.5)Zn_(1.0)Nb_(1.5)O_7 (BZN) thin films deposited at 650 °C under an oxygen pressure of 10 Pa by pulsed laser deposition were characterized as a function of zinc amount. The zinc concentration in the thin films was varied using ceramic targets having 0-40 mol% excess zinc contents. The X-ray diffraction measurement shows that thin films have a cubic pyrochlore phase structure and a strong preferential orientation of (111) plane. The dielectric properties are investigated as functions of temperature and frequency. Dielectric constant and loss tangent of the thin films both slightly increase with the increase of Zn amount. The thin film with 40 mol% zinc exhibits a dielectric constant of 198 and a loss tangent of 0.004 at 10 kHz. The dielectric relaxation behavior has been studied by measuring the temperature dependence of dielectric properties. The characteristic temperatures (T_m) move to the high temperature with the increase of Zn and gradually approach that of BZN ceramic. Meanwhile, in a wide frequency and temperature range (1 kHz-1 MHz, -100-150 °C), the dielectric constant of the thin films almost keeps unchanged and shows a negative temperature coefficient. Leakage current density of the thin films with 20 mol% zinc is approximately three order magnitude lower than that of films with 0mol% zinc at 400kV/cm. The conduction of BZN thin films is controlled by the Schottky emission mechanism and the space-charge-limited current mechanism.
机译:通过脉冲激光沉积在650°C,氧气压力为10 Pa的条件下沉积的烧绿石Bi_(1.5)Zn_(1.0)Nb_(1.5)O_7(BZN)薄膜的特性与锌量有关。使用具有0-40mol%过量锌含量的陶瓷靶来改变薄膜中的锌浓度。 X射线衍射测量表明,薄膜具有立方烧绿石相结构和(111)面的强优先取向。介电性能作为温度和频率的函数进行研究。薄膜的介电常数和损耗角正切均随Zn含量的增加而略有增加。锌含量为40摩尔%的薄膜在10 kHz时的介电常数为198,损耗角正切为0.004。通过测量介电特性的温度依赖性已经研究了介电弛豫行为。随着Zn的增加,特征温度(T_m)移至高温,并逐渐接近BZN陶瓷。同时,在较宽的频率和温度范围(1 kHz-1 MHz,-100-150°C)中,薄膜的介电常数几乎保持不变,并显示负温度系数。锌含量为20 mol%的薄膜的漏电流密度比锌含量为0 mol%的薄膜在400kV / cm时的漏电流密度低大约三个数量级。 BZN薄膜的导电受肖特基发射机制和空间电荷限制电流机制控制。

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