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首页> 外文期刊>Journal of Applied Polymer Science >Asymmetric polysulfone gas separation membranes treated by low pressure DC glow discharge plasmas
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Asymmetric polysulfone gas separation membranes treated by low pressure DC glow discharge plasmas

机译:低压直流辉光放电等离子体处理不对称聚砜气体分离膜

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Asymmetric polysulfone (PSF) gas separation membranes were prepared at different conditions such as non-solvent concentration, evaporation time (ET) and coagulation bath temperature (CBT). In addition, effects of low-pressure DC glow discharge plasma on the characteristics of PSF membranes were investigated. PSF membranes both before and after plasma treatment were characterized by several techniques, including contact angle measurement, scanning electron microscope (SEM), dynamic mechanical thermal analysis (DMTA), and atomic force microscopy (AFM). Furthermore, the performance of membranes was evaluated in terms of permeability of CO2, CH4, O-2,O- and N-2 gases. The ideal selectivity of CO2/CH4 and O-2/N-2 and surface free energy was calculated. Results showed that the EtOH concentration, ET and CBT affect the morphology of PSF membranes. For membranes prepared from a casting solution consisting of PSF 26.0, NMP 28.0, THF 28.0, and EtOH 18.0 wt % and ET for 3 min, the maximum selectivity of untreated membrane is about 69.76 and 12.59 for CO2/CH4 and O-2/N-2, respectively. After plasma treatment, the ideal selectivity is receded; however, the CO2/CH4 is still higher than 40.41 at pressure of 5 bars. Finally, preparation conditions and DC glow discharge plasmas have significant effects on the characteristics of the PSF membranes and result in an increase of the gas permeation. (c) 2015 Wiley Periodicals, Inc. J. Appl. Polym. Sci. 2015, 132, 42116.
机译:在不同的条件下(例如非溶剂浓度,蒸发时间(ET)和凝固浴温度(CBT))制备了不对称聚砜(PSF)气体分离膜。此外,研究了低压直流辉光放电等离子体对PSF膜特性的影响。等离子体处理之前和之后的PSF膜通过几种技术进行了表征,包括接触角测量,扫描电子显微镜(SEM),动态机械热分析(DMTA)和原子力显微镜(AFM)。此外,根据CO2,CH4,O-2,O-和N-2气体的渗透性评估了膜的性能。计算了CO2 / CH4和O-2 / N-2的理想选择性以及表面自由能。结果表明,EtOH浓度,ET和CBT会影响PSF膜的形态。对于由包含PSF 26.0,NMP 28.0,THF 28.0和EtOH 18.0 wt%和ET的浇铸溶液制得的膜3分钟,未处理的膜对CO2 / CH4和O-2 / N的最大选择性约为69.76和12.59。分别为-2。经过等离子处理后,理想的选择性降低了。但是,在5巴的压力下,CO2 / CH4仍高于40.41。最后,制备条件和直流辉光放电等离子体对PSF膜的特性有重大影响,并导致气体渗透增加。 (c)2015 Wiley Periodicals,Inc. J. Appl。 Polym。科学2015,132,42116。

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