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Application of artificial neural networks to predict the hardness of Ni-TiN nanocoatings fabricated by pulse electrodeposition

机译:人工神经网络在预测脉冲电沉积Ni-TiN纳米涂层硬度中的应用

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A three-layer backward propagation (BP) model was used to predict the hardness of Ni-TiN nanocoatings fabricated by pulse electrodeposition. The effect of plating parameters, namely, TiN particle concentration, current density, pulse frequency, and duty ratio on the hardness of Ni-TiN nanocoatings was investigated. The morphology, structure, and hardness of Ni-TiN nanocoatings were verified using scanning electron microscopy, white-light interfering profilometry, high-resolution transmission emission microscopy, and Rockwell hardness testing. The results indicated that the surface roughness of the Ni-TiN nanocoating is approximately 0.12 mu m. The average grain sizes of Ni and TiN on the Ni-TiN nanocoating are 62 and 30 nm, respectively. The optimum conditions for fabricating Ni-TiN nanocoatings based on the greatest hardness of Ni-TiN deposits are as follows: TiN particle concentration of 8 g/L, current density of 5 A/dm(2), pulse frequency of 80 Hz, and duty ratio of 0.7. We conclude that the BP model, with a maximum error of approximately 1.03%, can effectively predict the hardness of Ni-TiN nanocoatings. (C) 2015 Elsevier B.V. All rights reserved.
机译:使用三层向后传播(BP)模型来预测通过脉冲电沉积制备的Ni-TiN纳米涂层的硬度。研究了镀层参数,即TiN颗粒浓度,电流密度,脉冲频率和占空比对Ni-TiN纳米涂层硬度的影响。 Ni-TiN纳米涂层的形貌,结构和硬度使用扫描电子显微镜,白光干涉轮廓仪,高分辨率透射发射显微镜和罗克韦尔硬度测试进行了验证。结果表明,Ni-TiN纳米涂层的表面粗糙度约为0.12μm。 Ni-TiN纳米涂层上的Ni和TiN的平均晶粒尺寸分别为62 nm和30 nm。基于Ni-TiN沉积物的最大硬度来制造Ni-TiN纳米涂层的最佳条件如下:TiN颗粒浓度为8 g / L,电流密度为5 A / dm(2),脉冲频率为80 Hz,并且占空比为0.7。我们得出的结论是,BP模型的最大误差约为1.03%,可以有效预测Ni-TiN纳米涂层的硬度。 (C)2015 Elsevier B.V.保留所有权利。

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