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Structural, mechanical and tribological properties of WS_2-Ti composite coating with and without hard under layer of TiN

机译:含和不含TiN硬质下层的WS_2-Ti复合涂层的结构,力学和摩擦学性能

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摘要

The present work reports on the structural, mechanical and tribological properties of WS_2 and WS_2-Ti composite coating with and without hard under layer of TiN. Pulsed DC closed field unbalanced magnetron sputtering was employed for deposition of the films. The films were characterised with energy dispersive X-ray microanalysis (EDX), grazing incidence X-ray diffraction (GIXRD), field emission scanning electron microscopy (FESEM), Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), scratch adhesion test, nanoindentation test and pin-on-disc tribological test. The GIXRD spectrum for WS_2 film showed prominent orientation of (002) basal plane parallel to the substrate which was also supported by its morphology showing a fine granular structure. Addition of around 13 at.% Ti to the WS_2 matrix induced turbostratic stacking of the 10 L (L=0, 1, 2,…) planes, however, the (002) orientation was retained. The film’s hardness, adhesion to the substrate, as well as the tribological properties improvedwith Ti addition. Addition of a hard under layer of TiNresulted in a denser topWS2-Ti layer because of enhanced nucleation promoted by structural defects of the hard under layer. The tribological performance of the top WS_2-Ti layer also improved on TiN under layer addition because of the enhanced load bearing capacity of the top layer.
机译:本工作报告了带或不带TiN硬质下层的WS_2和WS_2-Ti复合涂层的结构,力学和摩擦学性能。脉冲直流闭场不平衡磁控溅射被用于沉积膜。薄膜通过能量色散X射线微分析(EDX),掠入射X射线衍射(GIXRD),场发射扫描电子显微镜(FESEM),拉曼光谱,X射线光电子能谱(XPS),划痕附着力测试,纳米压痕测试和针盘摩擦测试。 WS_2薄膜的GIXRD光谱显示(002)基面平行于底物的突出取向,其形态也显示出精细的颗粒结构,这也得到了支持。向WS_2基质中添加约13 at。%Ti会引起10 L(L = 0,1,2,...)平面的涡轮层堆积,但是(002)方向得以保留。钛的添加改善了薄膜的硬度,对基材的附着力以及摩擦学性能。由于硬质底层的结构缺陷促进了成核作用的增强,因此添加了TiN硬质底层导致了更致密的顶层WS2-Ti层。顶层WS_2-Ti层的摩擦学性能在添加层下的TiN上也得到了改善,因为顶层的承载能力增强。

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