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Characterization and haemocompatibility of fluorinated DLC and Si interlayer on Ti6Al4V

机译:Ti6Al4V上的氟化DLC和Si中间层的表征和血液相容性

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Fluorinated diamond-like carbon (F-DLC) films were deposited on Ti6Al4V substrates by radio frequency plasma enhanced chemical vapor deposition (rf PECVD) technique using a mixture of methane (CH_4) and tetrafluoromethane (CF_4) gasses. A 100nm Si interlayer was coated in advance by physical vapor deposition (PVD) to improve the adhesion between F-DLC and Ti alloy. A 200nm TiN-coated specimen with the same Ti6Al4V substrate was also built by PVD as a benchmark. The structure and surface properties of F-DLC coatings, prepared with various fluorine flow ratios, were investigated by using X-ray photoelectron spectroscopy, scanning electron microscopy, atomic force microscopy, liquid drop goniometry, and electrochemical corrosion tests. The blood compatibility was evaluated by measuring haemolysis ratio and platelet-covered area in vitro. The films' spectroscopic results show that the CF_x group and fluorine atomic concentration increase as CF_4 flow ratio is promoted in the mixture. The surface energy is reduced due to the increased fluorine content. The modified surfaces are characterized by higher hydrophobicity, lower thrombogenicity, and better corrosive protection than the virgin and TiN ones.
机译:通过射频等离子体增强化学气相沉积(rf PECVD)技术,使用甲烷(CH_4)和四氟甲烷(CF_4)气体的混合物,将氟化类金刚石碳(F-DLC)膜沉积在Ti6Al4V基板上。预先通过物理气相沉积(PVD)涂覆100nm的Si中间层,以改善F-DLC与Ti合金之间的附着力。 PVD还建立了具有相同Ti6Al4V衬底的200nm TiN涂层样品,作为基准。通过使用X射线光电子能谱,扫描电子显微镜,原子力显微镜,液滴测角法和电化学腐蚀试验研究了以各种氟流量比制备的F-DLC涂层的结构和表面性能。通过体外测量溶血率和血小板覆盖面积来评估血液相容性。薄膜的光谱结果表明,随着CF_4流量比的增加,CF_x基团和氟原子浓度增加。由于增加的氟含量而降低了表面能。改性表面的特征是与原始和TiN相比,具有更高的疏水性,更低的血栓形成性和更好的腐蚀防护性能。

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