首页> 外文期刊>The journal of physical chemistry, C. Nanomaterials and interfaces >Mechanism of Electroless Copper Deposition from [Cu(II)EDTA](2-)Complexes Using Aldehyde-Based Reductants
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Mechanism of Electroless Copper Deposition from [Cu(II)EDTA](2-)Complexes Using Aldehyde-Based Reductants

机译:醛基还原剂从[Cu(II)EDTA](2-)络合物中化学沉积铜的机理

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摘要

In this article, we present a mechanism for electroless copper deposition from alkaline solutions containing [Cu(II)EDTA]((aq))(2) and hydrolyzed aldehydes. The mechanism is based on quantum chemical calculations of the activation energies and reversible electron-transfer potentials. Low-coordinated, electroless-deposited surface Cu atoms are found to activate H abstraction from the CH bond of the aldehyde group, putting H on the surface and releasing a highly reducing electron in the process; this electron reduces [Cu(II)EDTA]((aq))(2) to [Cu(I)EDTA]((aq))(3). [Cu(I)EDTA]((aq))(3) is subsequently reduced to Cu-(ads)(0) by a second electron generated by the same process, releasing EDTA((aq))(4). Calculated reversible potentials for the reduction steps aid in interpretation of the catalytic behavior observed in experimental polarization curves.
机译:在本文中,我们提出了一种从含有[Cu(II)EDTA]((aq))(2)和水解醛的碱性溶液中化学镀铜的机理。该机制基于活化能和可逆电子转移电势的量子化学计算。发现低配位,化学沉积的表面Cu原子可激活从醛基团的CH键提取H的过程,将H置于表面并释放出高度还原的电子。该电子将[Cu(II)EDTA]((aq))(2)还原为[Cu(I)EDTA]((aq))(3)。 [Cu(I)EDTA]((aq))(3)随后通过相同过程产生的第二电子还原为Cu-(ads)(0),释放EDTA((aq))(4)。还原步骤的计算可逆电势有助于解释实验极化曲线中观察到的催化行为。

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