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首页> 外文期刊>The journal of physical chemistry, C. Nanomaterials and interfaces >Measurement of Interlayer Screening Length of Layered Graphene by Plasmonic Nanostructure Resonances
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Measurement of Interlayer Screening Length of Layered Graphene by Plasmonic Nanostructure Resonances

机译:等离子纳米结构共振测量层状石墨烯的层间筛选长度

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The variation in localized surface plasmon resonances of single Au nanodisks (diameter 100 nm and height 25 nm) on 0—13 graphene layers is investigated using dark-field scattering spectroscopy to obtain the graphene electric field screening length. For nanodisks (NDs) with and without underlying graphene layers on a SiO2 (300 nm)/Si substrate, the plasmon resonance red shifts from 604 to 620 nm with increasing graphene layers. The spectra of the plasmonic nanostructures obey an exponential saturation function versus increasing number of layers of graphene from 0 to 13. As a conducting film, the graphene layers screen the electric field generated by the plasmonic resonance of the Au NDs in the vicinity of the interface, and the red shifts of the resonance wavelength are explained in the framework of the electromagnetic field coupling between in-plane antiparallel image dipoles in the graphene layers and the ND dipole. A screening length of 1.2 ± 0.2 nm, equivalent to 3—4 graphene layers, is experimentally obtained, in good agreement with the measurement by field-effect transistors and theoretical calculation in doped graphene. The resonance shift of plasmonic nanostructures on a layered graphene system provides an alternative and convenient method for screening length measurement of graphene films.
机译:利用暗场散射光谱研究了单个金纳米盘(直径100 nm,高度25 nm)在0-13石墨烯层上的局部表面等离子体共振的变化,从而获得了石墨烯电场屏蔽的长度。对于在SiO2(300 nm)/ Si衬底上具有和不具有基础石墨烯层的纳米磁盘(NDs),随着石墨烯层的增加,等离振子共振红从604 nm转变为620 nm。等离子纳米结构的光谱服从指数饱和函数,随着石墨烯层数从0到13的增加。作为导电膜,石墨烯层屏蔽了界面附近Au ND的等离子共振产生的电场。 ,以及共振波长的红移是在石墨烯层中的面内反平行像偶极子与ND偶极子之间的电磁场耦合的框架下进行解释的。通过实验获得了相当于3至4个石墨烯层的1.2±0.2 nm的屏蔽长度,这与通过场效应晶体管进行的测量以及掺杂石墨烯的理论计算非常吻合。等离子纳米结构在层状石墨烯系统上的共振位移为筛选石墨烯膜的长度测量提供了另一种方便的方法。

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