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Thermal stability of vapor-deposited stable glasses of an organic semiconductor

机译:气相沉积的有机半导体稳定玻璃的热稳定性

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摘要

Vapor-deposited organic glasses can show enhanced kinetic stability relative to liquid-cooled glasses. When such stable glasses of model glassformers are annealed above the glass transition temperature T-g, they lose their thermal stability and transform into the supercooled liquid via constant velocity propagating fronts. In this work, we show that vapor-deposited glasses of an organic semiconductor, N,N'-bis(3-methylphenyl)-N,N'-diphenylbenzidine (TPD), also transform via propagating fronts. Using spectroscopic ellipsometry and a new high-throughput annealing protocol, we measure transformation front velocities for TPD glasses prepared with substrate temperatures (T-Substrate) from 0.63 to 0.96 Tg, at many different annealing temperatures. We observe that the front velocity varies by over an order of magnitude with T-Substrate, while the activation energy remains constant. Using dielectric spectroscopy, we measure the structural relaxation time of supercooled TPD. We find that the mobility of the liquid and the structure of the glass are independent factors in controlling the thermal stability of TPD films. In comparison to model glassformers, the transformation fronts of TPD have similar velocities and a similar dependence on T-Substrate, suggesting universal behavior. These results may aid in designing active layers in organic electronic devices with improved thermal stability. (C) 2015 AIP Publishing LLC.
机译:相对于液冷玻璃,气相沉积有机玻璃可以显示出增强的动力学稳定性。当这种稳定的模型玻璃成型者玻璃在高于玻璃化转变温度T-g的温度下退火时,它们失去热稳定性,并通过等速传播前沿转变为过冷液体。在这项工作中,我们表明有机半导体,N,N'-双(3-甲基苯基)-N,N'-二苯基联苯胺(TPD)的气相沉积玻璃也通过传播前沿转变。使用椭圆偏振光谱法和新的高通量退火协议,我们测量了在许多不同的退火温度下,底材温度(T-Substrate)为0.63至0.96 Tg的TPD玻璃的转变前沿速度。我们观察到,前速度随着T-基板的变化超过一个数量级,而激活能量保持恒定。使用介电谱,我们测量过冷TPD的结构弛豫时间。我们发现,液体的迁移率和玻璃的结构是控制TPD薄膜热稳定性的独立因素。与模型玻璃成型者相比,TPD的转变前沿具有相似的速度和对T基质的相似依赖性,这表明其具有普遍的行为。这些结果可以帮助设计具有改进的热稳定性的有机电子器件中的有源层。 (C)2015 AIP Publishing LLC。

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