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Tribological interaction between polytetrafluoroethylene and silicon oxide surfaces

机译:聚四氟乙烯与氧化硅表面之间的摩擦学相互作用

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We investigated the tribological interaction between polytetrafluoroethylene (PTFE) and silicon oxide surfaces. A simple rig was designed to bring about a friction between the surfaces via sliding a piece of PTFE on a thermally oxidized silicon wafer specimen. A very mild inclination (similar to 0.5 degrees) along the sliding motion was also employed in order to monitor the tribological interaction in a gradual manner as a function of increasing contact force. Additionally, some patterns were sketched on the silicon oxide surface using the PTFE tip to investigate changes produced in the hydrophobicity of the surface, where the approximate water contact angle was 45 degrees before the transfer. The nature of the transferred materials was characterized by X-ray photoelectron spectroscopy (XPS) and scanning electron microscopy (SEM). XPS results revealed that PTFE was faithfully transferred onto the silicon oxide surface upon even at the slightest contact and SEM images demonstrated that stable morphological changes could be imparted onto the surface. The minimum apparent contact pressure to realize the PTFE transfer is estimated as 5 kPa, much lower than reported previously. Stability of the patterns imparted towards many chemical washing processes lead us to postulate that the interaction is most likely to be chemical. Contact angle measurements, which were carried out to characterize and monitor the hydrophobicity of the silicon oxide surface, showed that upon PTFE transfer the hydrophobicity of the SiO2 surface could be significantly enhanced, which might also depend upon the pattern sketched onto the surface. Contact angle values above 100 degrees were obtained. (C) 2014 AIP Publishing LLC.
机译:我们研究了聚四氟乙烯(PTFE)与氧化硅表面之间的摩擦相互作用。设计了一种简单的钻机,通过在热氧化的硅晶片样品上滑动一块PTFE来在表面之间产生摩擦。为了沿着逐渐增加的接触力来逐步监测摩擦相互作用,还采用了沿滑动方向的非常缓和的倾斜度(类似于0.5度)。另外,使用PTFE尖端在氧化硅表面上绘制了一些图案,以研究表面疏水性的变化,其中在转移之前近似的水接触角为45度。转移材料的性质通过X射线光电子能谱(XPS)和扫描电子显微镜(SEM)表征。 XPS结果表明,即使在最轻微的接触下,PTFE也能忠实地转移到氧化硅表面上,而SEM图像表明,可以将稳定的形态变化赋予表面。实现PTFE转移的最小表观接触压力估计为5 kPa,远低于先前报道的压力。赋予许多化学洗涤过程的图案的稳定性使我们假设相互作用最可能是化学的。进行接触角测量以表征和监测氧化硅表面的疏水性,结果表明,通过PTFE转移,SiO2表面的疏水性可以显着提高,这也可能取决于绘制在表面上的图案。获得高于100度的接触角值。 (C)2014 AIP Publishing LLC。

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