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High-resolution threshold photoelectron study of the propargyl radical by the vacuum ultraviolet laser velocity-map imaging method

机译:真空紫外激光速度图成像方法对炔丙基自由基的高分辨率阈值光电子研究

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By employing the vacuum ultraviolet (VUV) laser velocity-map imaging (VMI) photoelectron scheme to discriminate energetic photoelectrons, we have measured the VUV-VMI-threshold photoelectrons (VUV-VMI-TPE) spectra of propargyl radical C _3H _3(X?2B _1) near its ionization threshold at photoelectron energy bandwidths of 3 and 7 cm ~(-1) (full-width at half-maximum, FWHM). The simulation of the VUV-VMI-TPE spectra thus obtained, along with the Stark shift correction, has allowed the determination of a precise value 70 156 ± 4 cm ~(-1) (8.6982 ± 0.0005 eV) for the ionization energy (IE) of C _3H _3. In the present VMI-TPE experiment, the Stark shift correction is determined by comparing the VUV-VMI-TPE and VUV laser pulsed field ionization-photoelectron (VUV-PFI-PE) spectra for the origin band of the photoelectron spectrum of the X?+-X? transition of chlorobenzene. The fact that the FWHMs for this origin band observed using the VUV-VMI-TPE and VUV-PFI-PE methods are nearly the same indicates that the energy resolutions achieved in the VUV-VMI-TPE and VUV-PFI-PE measurements are comparable. The IE(C _3H _3) value obtained based on the VUV-VMI-TPE measurement is consistent with the value determined by the VUV laser PIE spectrum of supersonically cooled C _3H _3(X?2B _1) radicals, which is also reported in this article.
机译:通过使用真空紫外(VUV)激光速度图成像(VMI)光电子方案来区分高能光电子,我们测量了炔丙基C _3H _3(X?)的VUV-VMI阈值光电子(VUV-VMI-TPE)光谱。 2B _1)在3和7 cm〜(-1)的光电子能带宽(半峰全宽,FWHM)附近接近其电离阈值。如此获得的VUV-VMI-TPE光谱的模拟以及Stark位移校正使得可以确定电离能(IE)的精确值70 156±4 cm〜(-1)(8.6982±0.0005 eV) )的C _3H _3。在目前的VMI-TPE实验中,通过比较VUV-VMI-TPE和VUV激光脉冲场电离-光电子(VUV-PFI-PE)光谱来确定X?的光电子谱带,来确定Stark位移校正。 + -X?氯苯的过渡。使用VUV-VMI-TPE和VUV-PFI-PE方法观察到的该原始频带的FWHM几乎相同的事实表明,在VUV-VMI-TPE和VUV-PFI-PE测量中获得的能量分辨率是可比的。基于VUV-VMI-TPE测量获得的IE(C _3H _3)值与由超声冷却的C _3H _3(X?2B _1)自由基的VUV激光PIE光谱确定的值一致,这也已在本报告中进行了报道。文章。

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