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Nanoporous silica-water interfaces studied by sum-frequency vibrational spectroscopy

机译:用和频振动光谱研究纳米多孔二氧化硅与水的界面

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摘要

Using sum-frequency vibrational spectroscopy, we found that water structure at nanoporous silica/ water interfaces depended on the nanoporous film structure. For a periodic, self-assembled nanoporous film with monosized 2 nm pores occupying 20% of the top surface area, the surface vibrational spectrum was dominated by water in contact with silica, bare or covered by silane, at the top surface. It resembled the spectral characteristic of the hydrophilic water/silica or the hydrophobic water/silane interface. For a fractal nanoporous film with pores ranging from 5 to 50 nm in size occupying 90% of the top surface, the spectrum for a trimethyl silane-coated superhydrophobic porous film resembled largely that of a water/air interface. Only when the silane was completely removed would the spectrum revert to that characteristic of a hydrophilic water/ silica interface. The surface charging behaviors of the bare nanoporous films in water with different pH were monitored by spectroscopic measurements and atomic force microscopy force measurements. The point of zero charge for the periodic porous film is around pH 2, similar to that of the flat silica surface. The point of zero charge could only be determined to be pH6 for the fractal porous film because the thin fractal solid network limited the amount of surface charge and therefore, the accuracy of the measurements.
机译:使用和频振动光谱法,我们发现纳米多孔二氧化硅/水界面处的水结构取决于纳米多孔膜结构。对于周期性的,自组装的纳米多孔膜,其孔径为2nm的纳米孔占顶表面积的20%,表面振动光谱的主要成分是水与顶表面上裸露或被硅烷覆盖的二氧化硅接触。它类似于亲水水/二氧化硅或疏水水/硅烷界面的光谱特征。对于具有在5至50nm范围内的孔占据顶表面的90%的尺寸的分形纳米多孔膜,三甲基硅烷涂覆的超疏水多孔膜的光谱在很大程度上类似于水/空气界面的光谱。只有完全除去硅烷后,光谱才能还原为亲水性水/二氧化硅界面的特征。通过光谱测量和原子力显微镜力测量监测裸露的纳米多孔膜在不同pH值的水中的表面充电行为。周期性多孔膜的零电荷点约为pH 2,类似于平坦的二氧化硅表面。对于分形多孔膜,零电荷点只能确定为pH6,因为薄的分形固体网络限制了表面电荷的数量,因此限制了测量的准确性。

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