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Symmetry-breaking and near-symmetry-breaking in three-electron-bonded radical cations

机译:三电子键自由基阳离子的对称破坏和近对称破坏

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The manifestations of the symmetry-breaking artifa~ in three-electron-bonded systems have been investigated at several computational levels including second-order M~ller-Plesset perturbation theory (MP2), coupled cluster (CC), and Bruckner-coupled cluster (B-CC) theories. The model systems, [HnX...XHn]+(X=Ne,F,O,N,Ar,Cl,S,P; n=0-3) cover all types of three-electron bonds that can possibly take place between atoms of the second and third rows of the Periodic Table. The critical interatomic distance beyond which symmetry breaking begins to take place at the Hartree-Fock and M~ller-Plesset levels are determined for each model system. Their magnitude are found to obey regular tendencies which are related to the compactness of the orbitals involved in the three-electron bonds. In all model systems, the onSets of symmetry-breaking at the MP2 level are greater or equal to the equilibrium bonding distance between the XHn fragments. The symmetry-breaking artifact results in severe discontinuities in the dissociation curves at the MP2 level. The CC level pushes away the occurrence of the artifact to larger distances but do not remove the discontinuities. The artifact is practically cured at the B-CC level with perturbative treatment of triple excitations. The onset of symmetry-breaking may in some cases be shortened by substituent effects, to the extent that it becomes shorter than the equilibrium bonding distance like in the Me4Oi and Me2Fi cation radicals that are found to be symmetry-unstable even in their equilibrium geometries. The artifact carries over to unsymmetrical sy
机译:已经在几个计算水平上研究了三电子键合系统中对称破坏产物的表现,包括二阶M〜ller-Plesset微扰理论(MP2),耦合簇(CC)和布鲁克纳耦合簇( B-CC)理论。模型系统[HnX ... XHn] +(X = Ne,F,O,N,Ar,Cl,S,P; n = 0-3)涵盖了可能发生的所有类型的三电子键在元素周期表的第二行和第三行的原子之间。对于每个模型系统,确定在Hartree-Fock和M〜ller-Plesset层开始发生对称破坏的临界原子间距离。发现它们的大小服从规律的趋势,该趋势与涉及三电子键的轨道的紧密性有关。在所有模型系统中,MP2级别的对称破坏的onSet大于或等于XHn片段之间的平衡键距。破坏对称性的伪像会导致MP2级别的解离曲线严重不连续。 CC级别将伪影的出现推到更大的距离,但不会消除不连续性。通过对三重激发进行微扰处理,可以在B-CC级别上将伪像实际固化。在某些情况下,对称性破坏的发生可能会因取代基效应而缩短到一定程度,使其变得比平衡键合距离更短,例如在Me4Oi和Me2Fi阳离子自由基中,即使对称几何形状也不对称,它们仍然不稳定。伪影延续到不对称系统

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