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Density-functional calculations of carbon doping in III-V compound semiconductors - art. no. 155202

机译:III-V型化合物半导体中碳掺杂的密度函数计算-艺术。没有。 155202

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摘要

This article reports the results of investigations based on local-density-functional theory into the relative formation energies for single substitutional carbon atoms in nine m-V compound semiconductors. The calculations are performed using a supercell formalism derived from the AIMPRO real-space cluster method. Only a very slight trend is discernible down the periodic table. When a metal atom is replaced with carbon, it is energetically least favorable in the phosphides, very marginally lower energy in the arsenides, and approximate to 0.5-0.7 eV lower in the antimonides. The situation is approximately reversed when a P, As, or Sb atom is substituted by a C atom: for the In compounds the energy is approximate to 0.4-0.8 eV higher than for the Al and Ga compounds. [References: 19]
机译:本文将基于局部密度泛函理论的研究结果报告给九个m-V化合物半导体中单个取代碳原子的相对形成能。使用从AIMPRO实空间聚类方法派生的超级单元形式来执行计算。在元素周期表中只有很小的趋势可辨别。当金属原子被碳取代时,它在磷化物上在能量上是最不利的,在砷化物中的能量非常低,而在锑化物中的能量大约低0.5-0.7 eV。当P,As或Sb原子被C原子取代时,情况大致相反:对于In化合物,能量大约比Al和Ga化合物高0.4-0.8 eV。 [参考:19]

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