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首页> 外文期刊>Physica, B. Condensed Matter >Electron-beam-induced current study of hydrogen passivation on grain boundaries in multicrystalline silicon: Influence of GB character and impurity contamination
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Electron-beam-induced current study of hydrogen passivation on grain boundaries in multicrystalline silicon: Influence of GB character and impurity contamination

机译:多晶硅晶界上氢钝化的电子束诱导电流研究:GB特性和杂质污染的影响

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摘要

The impacts of grain boundary (GB) character and impurity contamination level on the hydrogen passivation of GBs in multicrystalline silicon (mc-Si) were studied by means of an electron-beam-induced current (EBIC) technique. In mc-Si with a low contamination of Fe, the 300 K EBIC contrast of all kinds of GBs in the H-passivated state was weak and similar to that in the as-grown state. The 100 K EBIC contrast of Sigma (Sigma = 3, 9, and 27) GBs decreased about 75 -80%, whereas that of random and small-angle GBs decreased about 35 40%. Due to the different impurity gettering ability of different GBs, the variation in 100 K EBIC contrast hits suggested that the effect of H-passivation depends on both the GB character and impurity contamination level, In the mc-Si with heavy contamination of Fe, at both 300 and 100K, the EBIC contrast of both Sigma (Sigma = 3) and random GBs decreased but the ratio was < 40%, suggesting that the H-passivation is mainly affected by the impurity contamination level. (c) 2005 Elsevier B.V. All rights reserved.
机译:利用电子束感应电流(EBIC)技术研究了晶界(GB)特性和杂质污染水平对GBs在多晶硅(mc-Si)中的氢钝化的影响。在Fe污染低的mc-Si中,在H钝化状态下,各种GB的300 K EBIC对比度均较弱,并且与生长态相似。 Sigma(Sigma = 3、9和27)GB的100 K EBIC对比度降低约75 -80%,而随机和小角度GB的100 K EBIC对比度降低约35 40%。由于不同GB的杂质吸收能力不同,所以100 K EBIC对比命中率的变化表明,H钝化的效果取决于GB特性和杂质污染水平。在300和100K时,西格玛(Sigma = 3)和随机GBs的EBIC对比度均下降,但比率<40%,这表明H钝化主要受杂质污染水平的影响。 (c)2005 Elsevier B.V.保留所有权利。

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