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首页> 外文期刊>Physical chemistry chemical physics: PCCP >In situ growth of MoS2 nanosheets on reduced graphene oxide (RGO) surfaces: interfacial enhancement of absorbing performance against electromagnetic pollution
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In situ growth of MoS2 nanosheets on reduced graphene oxide (RGO) surfaces: interfacial enhancement of absorbing performance against electromagnetic pollution

机译:MoS2纳米片在还原的氧化石墨烯(RGO)表面上原位生长:界面吸收性能的增强,可抵抗电磁污染

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摘要

Electromagnetic pollution is rising all over the world. Compared with electromagnetic waves reflection, electromagnetic absorption (EA) is a better choice to balance electromagnetic applications and human health. The highly conductive networks in composites, as well as in species, and the intensity of defect polarization are the most important factors to improving the EA performance of a dielectric material. In this study, an in situ one-pot hydrothermal growth of MoS2 layers on reduced graphene oxide (RGO) surfaces was developed for the synthesis of RGO/MoS2 nanosheets. With a filler loading ratio of 20 wt%, the composite of the RGO/MoS2 nanosheets could build conductive networks and exhibited an effective EA bandwidth (lower than -10 dB) of 5.7 GHz and a minimum reflection loss (RL) of -60 dB. The results revealed that the as-prepared RGO/MoS2 nanosheets are promising EA materials, with broad and strong absorption properties at a low filler loading and low thickness.
机译:电磁污染在全世界范围内都在增加。与电磁波反射相比,电磁吸收(EA)是平衡电磁应用和人体健康的更好选择。复合材料以及物种中的高导电网络以及缺陷极化的强度是提高介电材料EA性能的最重要因素。在这项研究中,MoS2层在还原氧化石墨烯(RGO)表面上的原位一锅水热生长被开发用于RGO / MoS2纳米片的合成。 RGO / MoS2纳米片的填充物填充率为20 wt%,可以构建导电网络,并具有5​​.7 GHz的有效EA带宽(低于-10 dB)和-60 dB的最小反射损耗(RL) 。结果表明,所制备的RGO / MoS2纳米片是很有前途的EA材料,在低填充量和低厚度下具有广泛而强大的吸收性能。

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