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Theoretical study on the surface stabilities, electronic structures and water adsorption behavior of the Ta3N5(110) surface

机译:Ta3N5(110)表面的表面稳定性,电子结构和水吸附行为的理论研究

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A recent experiment revealed that the Ta3N5 semiconductor with orientation along the (110) surface exhibited improved photoelectrochemical activities, but the role of the (110) surface in the improved photoelectrochemical activity remains unclear. In this study, density functional theory calculations were performed to investigate the surface stabilities, surface electronic structures and water splitting behavior of the Ta3N5(110) surface with and without oxygen impurities. The results showed that, on the clean and oxygen impurity containing (110) surfaces, the energy barriers of water splitting were as low as 0.05 and 0.06 eV, respectively, suggesting that the Ta3N5(110) surface is a promising candidate for water splitting. The lower energy barriers of water splitting on the Ta3N5(110) surface may be ascribed to the easy migration of the H atom from the surface Ta atom to the nearby N atom. Furthermore, the surface energies and surface electronic structures revealed that the Ta3N5(110) surface contained less oxygen impurities, which is in accordance with the experimental observations.
机译:最近的实验表明,沿(110)表面取向的Ta3N5半导体表现出改善的光电化学活性,但是(110)表面在改善的光电化学活性中的作用仍不清楚。在这项研究中,进行了密度泛函理论计算,以研究具有和不具有氧杂质的Ta3N5(110)表面的表面稳定性,表面电子结构和水分解行为。结果表明,在清洁且含氧杂质的(110)表面上,水分解的能垒分别低至0.05和0.06 eV,这表明Ta3N5(110)表面是有希望的水分解候选物。 Ta 3 N 5(110)表面上水分裂的较低能垒可归因于H原子易于从表面Ta原子迁移到附近的N原子。此外,表面能和表面电子结构表明Ta3N5(110)表面含有较少的氧杂质,这与实验观察结果一致。

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