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Computer simulations of 3C-SiC under hydrostatic and non-hydrostatic stresses

机译:静水和非静水应力下3C-SiC的计算机模拟

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The response of 3C-SiC to hydrostatic pressure and to several uni- and bi-axial stress conditions is thoroughly investigated using first principles calculations. A topological interpretation of the chemical bonding reveals that the so-called non-covalent interactions enhance only at high pressure while the nature of the covalent Si-C bonding network keeps essentially with the same pattern. The calculated low compressibility agrees well with experimental values and is in concordance with the high structural stability of this polymorph under hydrostatic pressure. Under uniaxial [001] stress, the c/a ratio shows a noticeable drop inducing a closure of the band gap and the emergence of a metallic state around 40 GPa. This behavior correlates with a plateau of the electron localization function exhibiting a roughly constant and non-negligible value surrounding CSi4 and SiC4 covalent bonded units.
机译:使用第一性原理计算,彻底研究了3C-SiC对静水压力以及几种单轴和双轴应力条件的响应。化学键的拓扑解释表明,所谓的非共价相互作用仅在高压下会增强,而共价Si-C键网络的性质基本上保持相同。计算出的低压缩率与实验值非常吻合,并且与该多晶型物在静水压力下的高结构稳定性相一致。在单轴[001]应力下,c / a比值显示出明显的下降,导致带隙的闭合和40 GPa附近金属态的出现。该行为与电子局部化功能的平稳相关,该电子局部化函数在CSi4和SiC4共价键合单元周围表现出大致恒定且不可忽略的值。

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