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Lateral shifts and photon tunneling in a frustrated total internal reflection structure with a negative-zero-positive index metamaterial

机译:具有负零正折射率超材料的受挫全内反射结构中的横向位移和光子隧穿

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Motivated by the realization of the Dirac point (DP) with a double-cone structure for optical field in the negative-zero-positive index metamaterial (NZPIM), the lateral shift and tunneling time of photon tunneling through a frustrated total internal reflection structure containing a NZPIM barrier are investigated by employing Artman's stationary phase method. Near the DP, the lateral shift can vary from positive to negative and the photon tunneling displays a superluminal dynamic. Because of the Hartman effect, both lateral shift and tunneling time tend to a saturation value when the barrier thickness increases. These results may lead to potential applications in integral optics and optical-based devices and also suggest analogous phenomena of valance electron in single-layered carbon graphene.
机译:受到负零正折射率超材料(NZPIM)中具有双锥结构的光场的狄拉克点(DP)的推动,光子通过受挫的全内反射结构隧穿的横向位移和隧穿时间采用Artman固定相方法研究NZPIM势垒。在DP附近,横向偏移可以从正变到负,并且光子隧穿显示出超腔动力学。由于哈特曼效应,当势垒厚度增加时,横向位移和隧穿时间都趋于饱和值。这些结果可能导致在集成光学器件和基于光学的器件中的潜在应用,并且还暗示了单层碳石墨烯中价电子的类似现象。

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