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首页> 外文期刊>Langmuir: The ACS Journal of Surfaces and Colloids >Fundamental studies of electrochemically controlled surface oxidation and hydrophobicity of natural enargite
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Fundamental studies of electrochemically controlled surface oxidation and hydrophobicity of natural enargite

机译:天然珐琅石的电化学控制表面氧化和疏水性的基础研究

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摘要

The surface oxidation and hydrophobicity of natural enargite (Cu _3AsS_4) and the formation of oxidation species at the mineral surface have been examined by a novel experimental approach that combines electrochemical techniques and atomic force microscopy (AFM). This approach allows for in-situ, synchronized electrochemical control and examination of the oxidative surface morphology of enargite. Combined with ex-situ cryo X-ray photoelectron spectroscopy surface analysis, the surface speciation of enargite surface oxidation has been obtained, comparing the newly fractured natural enargite surface with those that have been electrochemically oxidized at pHs 4 and 10. At pH 4, surface layer formations consisting of metal-deficient sulfide and elemental sulfur were identified, associated with a limited increase in root-mean-square (rms) roughness (1.228 to 3.143 nm) and apparent heterogeneous distribution of surface products as demonstrated by AFM imaging. A mechanism of initial rapid dissolution of Cu followed by diffusion-limited surface layer deposition was identified. At pH 10, a similar mechanism was identified although the differences between the initial and diffusion-limited phases were less definitive. Surface species were identified as copper sulfate and copper hydroxide. A significant increase in surface roughness was found as rms roughness increased from 0.795 to 9.723 nm. Dynamic (receding) contact angle measurements were obtained by a droplet evaporation method. No significant difference in the contact angle on a surface oxidized at pH 10 and the freshly polished surface was found. A significant difference was found between the polished surface and that oxidized at pH 4, with an increase in contact angle of about 13 (46 to 59) after oxidation. Competing effects of hydrophilic (copper oxides and hydroxides) and hydrophobic (elemental sulfur) species on the mineral surface under oxidizing conditions at pH 4 and the change in surface roughness at pH 10 may contribute to the observed effects of electrochemically controlled oxidation on enargite hydrophobicity.
机译:通过结合电化学技术和原子力显微镜(AFM)的新型实验方法,研究了天然en石(Cu _3AsS_4)的表面氧化和疏水性以及在矿物表面的氧化物种的形成。这种方法允许原位同步电化学控制和检查扣铁的氧化表面形态。结合异位低温X射线光电子能谱表面分析,通过比较新近破碎的天然辉石表面与在pH 4和10下被电化学氧化的天然辉石表面,获得了辉石表面氧化的表面形态。如AFM成像所示,确定了由缺乏金属的硫化物和元素硫组成的金属层形成,与均方根(rms)粗糙度(1.228至3.143 nm)的有限增加和表面产物的明显异质分布有关。确定了Cu最初快速溶解然后扩散受限的表面层沉积的机制。在pH 10时,虽然初始阶段和扩散受限阶段之间的差异不确定性确定,但仍鉴定出相似的机理。表面物质被鉴定为硫酸铜和氢氧化铜。发现均方根粗糙度从0.795 nm增加到9.723 nm,表面粗糙度显着增加。通过液滴蒸发法获得动态(后退)接触角测量值。发现在pH 10氧化的表面和新抛光的表面上的接触角没有显着差异。发现抛光表面与在pH 4时被氧化的表面之间存在显着差异,氧化后接触角增加了约13(46至59)。在pH为4的氧化条件下,矿物表面上的亲水性(铜氧化物和氢氧化物)和疏水性(元素硫)物种的竞争效应以及pH值为10时表面粗糙度的变化可能有助于观察到电化学控制氧化对硬辉石疏水性的影响。

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