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首页> 外文期刊>Langmuir: The ACS Journal of Surfaces and Colloids >Nanoscale Friction Switches: Friction Modulation of Monomolecular Assemblies Using External Electric Fields
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Nanoscale Friction Switches: Friction Modulation of Monomolecular Assemblies Using External Electric Fields

机译:纳米级摩擦开关:使用外部电场的单分子组件的摩擦调制

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This paper presents experimental investigations to actively modulate the nanoscale friction properties of a self-assembled monolayer (SAM) assembly using ail external electric field that drives conformational changes in the SAM. Such "friction switches" have widespread implications in interfacial energy control in microanoscale devices. Friction response of a low-density mercaptocarboxylic acid SAM is evaluated using an atomic force microscope (AFM) in the presence of a DC bias applied between the sample and the AFM probe tinder a nitrogen (dry) environment. The low density allows reorientation of individual SAM molecules to accommodate the attractive force between the -COOH terminal group and a positively biased surface. This enables the surface to present a hydrophilic group ora hydrophobic backbone to the contacting AFM probe depending upon the direction of the field (bias). Synthesis and deposition of the low-density SAM (LD-SAM) is reported. Results from AFM experiments show ail increased friction response (up to 300%) of the LD-SAM system in the presence of a positive bias compared to the friction response in the presence of a negative bias. The difference in the friction response is attributed to the change in the structural and crystalline order of the film in addition to the interfacial surface chemistry and composition presented upon application of the bias.
机译:本文提出了实验研究,以利用所有外部电场驱动SAM中的构象变化,主动调节自组装单层(SAM)组件的纳米级摩擦性能。这种“摩擦开关”在微米/纳米级设备的界面能量控制中具有广泛的意义。使用原子力显微镜(AFM)在样品和AFM探针之间施加直流偏压(在氮气(干燥)环境下)的情况下,使用原子力显微镜(AFM)评估低密度巯基羧酸SAM的摩擦响应。低密度允许单个SAM分子重新取向,以适应-COOH端基和正偏压表面之间的吸引力。这使表面能够根据场的方向(偏向)向接触的AFM探针提供亲水基团或疏水主链。报道了低密度SAM(LD-SAM)的合成和沉积。 AFM实验的结果表明,与存在负偏置时的摩擦响应相比,在存在正偏置时,LD-SAM系统的摩擦响应均增加(高达300%)。摩擦响应的差异归因于膜的结构和结晶顺序的变化,以及施加偏压时所呈现的界面表面化学性质和组成。

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