Large area hexagonal boron nitride monolayer as efficient atomically thick insulating coating against friction and oxidation

摘要

Coating is the most widely applied technology to improve surface properties of substrates, and nanotechnology has been playing an important role in enhancing the coating performance. However, the tunability of surface properties by a single atomic layer remains poorly understood. Here we demonstrate that a chemical vapor deposited hexagonal boron nitride (h-BN) monolayer of large area and high quality can serve as a perfect coating to significantly improve friction, oxidation and electric resistance of the substrates. The exceptional low friction and insulation of h-BN monolayer coating facilitate the characterization of the h-BN film vividly by atomic force microscopy, showing the h-BN monolayer consists of domains with size within a few micrometers. This excellent coating performance together with the exceptional high thermal and chemical stability make the h-BN monolayer a promising coating material.