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Large photocurrents in single layer graphene thin films: Effects of diffusion and drift

机译:单层石墨烯薄膜中的大光电流:扩散和漂移的影响

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摘要

This paper reports large photocurrents in air-assisted depositions of single layer graphene (derived from reduced single layer graphene oxide) upon illumination with near-infrared (NIR) light. NIR-induced charge carrier generation and subsequent separation at the metalgraphene interface resulted in photocurrent generation. Varying bias voltages were applied to test samples and allowed for evaluating photoresponses in either diffusion- or drift-dominated regions. In the diffusion-dominated region, position-dependent effects of photoconductivity were demonstrated. The photocurrent exhibited increase when the positive electrode was illuminated, decrease when the negative electrode was illuminated, and negligible response when the area between the electrodes was illuminated. At a 100μV bias voltage, a per cent change in current from 150% (40mW NIR) to 1800% (335mW NIR) is reported. Such large photocurrent responses result from built-in electric fields and optically generated temperature gradients (maximum NIR-induced temperature rise 70°C). The per cent photocurrent change was observed to depend on both annealing temperature and NIR power, but not resistance value. In the drift-dominated realm, a Gaussian photocurrent profile was obtained, signaling drift of charge carriers with increase in localized electric field, akin to the classic HaynesShockley experiment. A minority carrier mobility value of μ700cm ~2V ~1s ~1 is reported. The simple low cost graphene devices presented in this paper were fabricated without lithographic processing and are ideal candidates for assorted infrared imaging applications.
机译:本文报道了在近红外(NIR)光照下空气辅助沉积的单层石墨烯(源自还原的单层石墨烯氧化物)中的大量光电流。 NIR诱导的电荷载流子产生以及随后在金属石墨烯界面的分离导致光电流产生。将不同的偏置电压施加到测试样品,并用于评估扩散或漂移为主的区域中的光响应。在扩散占主导的区域,证明了光电导的位置依赖性效应。当正电极被照明时,光电流表现出增加,当负电极被照明时,光电流表现出降低,而当电极之间的区域被照明时,光电流的响应可忽略不计。据报道,在100μV偏置电压下,电流从150%(40mW NIR)到1800%(335mW NIR)的百分比变化。如此大的光电流响应是由内置电场和光学产生的温度梯度(NIR引起的最大温度升高70°C)引起的。观察到光电流百分比变化取决于退火温度和NIR功率,但不取决于电阻值。在漂移主导的领域中,获得了高斯光电流曲线,这表明电荷载流子随局部电场的增加而漂移,类似于经典的HaynesShockley实验。据报道,少数载流子迁移率值为μ700cm〜2V〜1s〜1。本文介绍的简单的低成本石墨烯器件无需进行光刻处理即可制造,是各种红外成像应用的理想选择。

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