MODELING A MIM CAPACITOR INCLUDING SERIES RESISTANCE AND INDUCTANCE FOR CHARACTERIZING NANOMETER HIGH-K DIELECTRIC FILMS

摘要

A model to represent the parasitic series resistance and inductance inherent to the capacitor plates is proposed. The model is used to determine the frequency-dependent permittivity and loss tangent of high-k dielectrics (HfO2 and Al2O3) in metal-insulator-metal capacitors. Experimental results are in agreement with nominal values reported in the literature. (C) 2016 Wiley Periodicals, Inc.