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首页> 外文期刊>Microwave and optical technology letters >A W-BAND POWER DETECTOR RFIC DESIGN IN 0.13 mu m SIGE BiCMOS PROCESS
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A W-BAND POWER DETECTOR RFIC DESIGN IN 0.13 mu m SIGE BiCMOS PROCESS

机译:0.13μmSIGE BiCMOS工艺中的W波段功率检测器RFIC设计

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This article presents the results of a wideband power detector radio frequency integrated circuit design intended for W-band passive imaging sensors. The power detector was fabricated in a 0.13 mu m SiGe BiCMOS process technology with 300 GHz/500 GHz f(T)/f(max). The experimental results show broadband RF properties such as a responsivity of 40-60 kV/W and a noise equivalent power (NEP) of 0.3-0.4 pW/Hz(1/2) at 70-95 GHz, respectively (the DC power consumption is 225 mu W). To the authors' best knowledge, the SiGe detector design reports the widest s(11) -10 dB bandwidth (s(11)-10 dB at 79-102 GHz) among silicon based W-band power detectors and is competitive with InP-based W-band detectors in terms of a higher responsivity and similar NEP. (c) 2015 Wiley Periodicals, Inc. Microwave Opt Technol Lett 57:414-417, 2015
机译:本文介绍了旨在用于W波段无源成像传感器的宽带功率检测器射频集成电路设计的结果。功率检测器采用0.13μmSiGe BiCMOS工艺技术制造,具有300 GHz / 500 GHz f(T)/ f(max)。实验结果表明,宽带RF特性例如在70-95 GHz时的响应度为40-60 kV / W,噪声等效功率(NEP)为0.3-0.4 pW / Hz(1/2)(直流功耗)是225亩W)。据作者所知,SiGe检测器设计报告了硅基W波段功率检测器中最宽的s(11)-10 dB带宽(在79-102 GHz时为s(11)-10 dB),并且与InP-更高的响应度和相似的NEP方面的基于W波段的探测器。 (c)2015年,Wiley Periodicals,Inc.微波Opt Technol Lett 57:414-417,2015年

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