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Glancing angle deposited Ni nanopillars coated with conformal, thin layers of Pt by a novel electrodeposition: Application to the oxygen reduction reaction

机译:通过新型电沉积方法,在掠射角上沉积的Ni纳米柱上涂覆了一层保形的Pt薄层:应用于氧还原反应

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Glancing Angle Deposition (GLAD) was used to prepare 500 nm long Ni nanopillars directly on glassy carbon disc electrodes (Ni-GLAD/GC). Ni-GLAD{Pt}/GC core-layer nanopillars were prepared by depositing Pt on the Ni-GLAD substrate via a novel rotating disc electrode galvanostatic deposition, where a stationary blackened Pt counter electrode served as the Pt source. Scanning electron microscopy, cyclic voltammetry, and inductively-coupled mass spectrometry were employed to characterize the deposits. Results indicated that the Pt was deposited in a conformal manner on the Ni-GLAD giving a loading of 11.6 mu g. The Ni-GLAD{Pt}/GC electrode was ca. three fold more active than a {Pt}/GC (made with the same deposition in the absence of Ni) towards the oxygen reduction reaction (ORR) in 1.0 M KOH. As well, long term potentiostatic ORR studies showed the Ni-GLAD{Pt}/GC deposit was more durable than the {Pt}/GC, with the former completely retaining its initial performance after 5000 s polarization at 0.85 V vs. RHE, while {Pt}/GC lost 38% of its activity. Subsequent control experiments in the absence of O-2 showed that such decay was not due to loss of Pt over the prolonged ORR. (C) 2014 Elsevier Ltd. All rights reserved.
机译:掠角沉积(GLAD)用于直接在玻璃碳盘电极(Ni-GLAD / GC)上制备500 nm长的Ni纳米柱。 Ni-GLAD {Pt} / GC核心层纳米柱是通过新型的旋转圆盘电极恒电流沉积法在Ni-GLAD基底上沉积Pt制备的,其中固定的变黑Pt对电极用作Pt源。扫描电子显微镜,循环伏安法和电感耦合质谱法用于表征沉积物。结果表明Pt以保形方式沉积在Ni-GLAD上,负载量为11.6μg。 Ni-GLAD {Pt} / GC电极约为。在1.0 M KOH中,对氧气还原反应(ORR)的活性比{Pt} / GC(在没有Ni的情况下以相同的沉积方式制备)的活性高3倍。同样,长期的恒电位ORR研究表明,Ni-GLAD {Pt} / GC沉积层比{Pt} / GC更加耐用,前者在0.85 V vs. RHE极化5000 s后完全保持了其初始性能,而{Pt} / GC失去了38%的活动。随后在没有O-2的情况下进行的对照实验表明,这种衰变不是由于延长的ORR导致的Pt损失。 (C)2014 Elsevier Ltd.保留所有权利。

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