Modified Polymer Substrates for the Formation of Submicron Particle Ensembles from Colloidal Solution

摘要

Methods for targeted regulation of the surface properties of polymer film materials (substrates) by fluorination and sulfonation have been considered. It has been shown by the examples of polyethylene, polypropylene, and poly(ethylene terephthalate) films that these methods can be used for the production of polymer films with controlled values of water contact angle from 20 degrees to 88 degrees, adhesion force from 23 to 141 rel. units, and surface roughness parameter R-a from 35 to 382 nm. This set of substrates may be used to optimize the methods for the formation of structured functional polymer surfaces. In particular, the regularities of the formation of solid deposits of colloidal submicron particles during evaporation of droplets of their solutions have been shown to vary with variations in substrate characteristics.