Synthesis and Characterization of Copper(I) Amidinates as Precursors for Atomic Layer Deposition (ALD) of Copper Metal

摘要

A series of copper(l) amidinates of the general type [(R'NC(R)NR")Cu]_2 (R' and R" = n-propyl,isopropyl,n-butyl,isobutyl,sec-butyl,tert-butyl;R = methyl,n-butyl) have been synthesized and characterized.These compounds are planar dimers,bridged by nearly linear N-Cu-N bonds.Their properties (volatility,low melting point,high thermal stability,and self-limited surface reactivity) are well-suited for atomic layer deposition (ALD) of copper metal muLms that are pure,highly conductive,conformal,and strongly adherent to substrates.