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Interpretation of dark-field contrast and particle-size selectivity in grating interferometers

机译:光栅干涉仪中暗场对比度和粒度选择性的解释

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In grating-based x-ray phase sensitive imaging, dark-field contrast refers to the extinction of the interference fringes due to small-angle scattering. For configurations where the sample is placed before the beamsplitter grating, the dark-field contrast has been quantified with theoretical wave propagation models. Yet when the grating is placed before the sample, the dark-field contrast has only been modeled in the geometric optics regime. Here we attempt to quantify the dark-field effect in the grating-before-sample geometry with first-principle wave calculations and understand the associated particle-size selectivity. We obtain an expression for the dark-field effect in terms of the sample material's complex refractive index, which can be verified experimentally without fitting parameters. A dark-field computed tomography experiment shows that the particle-size selectivity can be used to differentiate materials of identical x-ray absorption.
机译:在基于光栅的X射线相位敏感成像中,暗场对比度是指由于小角度散射而导致的干涉条纹的消失。对于将样品放置在分束器光栅之前的配置,已使用理论波传播模型对暗场对比度进行了量化。但是,当将光栅放置在样品之前时,仅在几何光学系统中对暗场对比度进行了建模。在这里,我们尝试通过第一原理波计算来量化样品前光栅几何中的暗场效应,并了解相关的粒度选择性。我们根据样品材料的复折射率获得了暗场效应的表达式,可以在没有拟合参数的情况下进行实验验证。暗场计算机断层扫描实验表明,粒度选择性可用于区分吸收相同X射线的材料。

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