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Characterization of the optical properties of an infrared blocked impurity band detector

机译:红外阻隔杂质带检测器的光学特性表征

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摘要

Si:As blocked impurity band detectors have been partially deprocessed and measured by Fourier transform spectroscopy to determine their transmittance and reflectance at cryogenic temperatures over the wavelength range 2 (mu)m to 40 (mu)m. A method is presented by which the propagation constants can be extracted from an inversion of the transmittance and reflectance data. The effective propagation constants for the active layer from 2 (mu)m to 20 (mu)m were calculated as well as the absorption cross section of arsenic in silicon, which agrees well with previous results from the literature. The infrared absorptance of the full detector was determined, and the analytical method also provides an estimate of absorption in the active layer alone. Infrared absorptance of the active layer is compared to the quantum yield measured by photoelectric means on similar detectors. The optical methods outlined here, in conjunction with standard electronic measurements, could be used to predict the performance of such detectors from measurements of the blanket films from which they are to be fabricated.
机译:Si:As阻挡的杂质带检测器已被部分处理,并通过傅里叶变换光谱法进行测定,以确定其在低温下在2μm至40μm波长范围内的透射率和反射率。提出了一种方法,通过该方法可以从透射率和反射率数据的反演中提取传播常数。计算了有源层在2μm至20μm范围内的有效传播常数以及砷在硅中的吸收截面,这与文献先前的结果非常吻合。确定了整个探测器的红外吸收率,并且分析方法还提供了仅在活性层中吸收的估计值。将活性层的红外吸收率与通过类似装置上的光电装置测得的量子产率进行比较。此处概述的光学方法与标准电子测量方法结合使用,可以根据要制造其的覆盖膜的测量结果来预测此类检测器的性能。

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