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首页> 外文期刊>Analytica chimica acta >Total inorganic arsenic detection in real water samples using anodic stripping voltammetry and a gold-coated diamond thin-film electrode
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Total inorganic arsenic detection in real water samples using anodic stripping voltammetry and a gold-coated diamond thin-film electrode

机译:使用阳极溶出伏安法和镀金金刚石薄膜电极对真实水样中的总无机砷进行检测

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An accurate method for total inorganic arsenic determination in real water samples was developed using differential pulse anodic stripping voltammetry (DPASV) and a Au-coated boron-doped diamond thin-film electrode. Keys to the method are the use of a conducting diamond platform and solid phase extraction for sample preparation. In the method, the As(III) present in the sample is first detected by DPASV. The As(V) present is then reduced to As(III) by reaction with Na2SO3 and this is followed by a second detection of As(III) by DPASV. Interfering metal ions (e.g., Cu(II)) that cause decreased electrode response sensitivity for arsenic in real samples are removed by solid phase extraction as part of the sample preparation. For example, Cu(II) caused a 30% decrease in the As stripping peak current at a solution concentration ratio of 3:1 (Cu(II)/As(III)). This loss was mitigated by passage of the solution through a Chelex 100 cation exchange resin. After passage, only a 5% As stripping current response loss was seen. The effect of organic matter on the Au-coated diamond electrode response for As(III) was also evaluated. Humic acid at a 5 ppm concentration caused only a 9% decrease in the As stripping peak charge for Au-coated diamond. By comparison, a 50% response decrease was observed for Au foil. Clearly, the chemical properties of the diamond surface in the vicinity of the metal deposits inhibit molecular adsorption on at least some of the Au surface. The method provided reproducible and accurate results for total inorganic arsenic in two contaminated water samples provided by the U.S. Bureau of Reclamation. The total inorganic As concentration in the two samples, quantified by the standard addition method, was 23.2 ± 2.9 ppb for UV plant influent water and 16.4 ± 0.9 ppb for Well 119 water (n = 4). These values differed from the specified concentrations by less than 4%.
机译:建立了一种使用差分脉冲阳极溶出伏安法(DPASV)和金包膜的掺硼金刚石薄膜电极测定实际水样中总无机砷的准确方法。该方法的关键是使用导电金刚石平台和固相萃取进行样品制备。在该方法中,首先通过DPASV检测样品中存在的As(III)。然后通过与Na2SO3反应将存在的As(V)还原为As(III),然后通过DPASV对As(III)进行第二次检测。作为样品制备的一部分,通过固相萃取去除了导致实际样品中砷对电极响应灵敏度降低的金属干扰离子(例如Cu(II))。例如,Cu(II)以3:1的溶液浓度比(Cu(II)/ As(III))导致As溶出峰电流降低30%。通过使溶液通过Chelex 100阳离子交换树脂可以减轻这种损失。通过之后,仅观察到5%的As剥离电流响应损耗。还评估了有机物对As(III)的Au涂层金刚石电极响应的影响。浓度为5 ppm的腐殖酸仅使Au涂层金刚石的As溶出峰电荷降低了9%。相比之下,金箔的响应降低了50%。显然,在金属沉积物附近的金刚石表面的化学性质抑制了至少一些Au表面上的分子吸附。该方法为美国垦殖局提供的两个受污染水样中的总无机砷提供了可重现和准确的结果。通过标准添加方法定量,两个样品中的无机总砷浓度对于UV植物进水为23.2±2.9 ppb,对于119井水为16.4±0.9 ppb(n = 4)。这些值与规定的浓度相差不到4%。

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