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Monitoring DNA Hybridization and Thermal Dissociation at the Silica/Water Interface Using Resonantly Enhanced Second Harmonic Generation Spectroscopy

机译:使用共振增强二次谐波产生光谱法监测二氧化硅/水界面处的DNA杂交和热解离

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The immobilization of oligonucleotide sequences onto glass supports is central to the field of biodiagnostics and molecular biology with the widespread use of DNA microarrays. However, the influence of confinement on the behavior of DNA immobilized on silica is not well understood owing to the difficulties associated with monitoring this buried interface. Second harmonic generation (SHG) is an inherently surface specific technique making it well suited to observe processes at insulator interfaces like silica. Using a universal 3-nitropyrolle nucleotide as an SHG-active label, we monitored the hybridization rate and thermal dissociation of a 15-mer of DNA immobilized at the silica/aqueous interface. The immobilized DNA exhibits hybridization rates on the minute time scale, which is much slower than hybridization kinetics in solution but on par with hybridization behavior observed at electrochemical interfaces. In contrast, the thermal dissociation temperature of the DNA immobilized on silica is on average 12℃ lower than the analogous duplex in solution, which is more significant than that observed on other surfaces like gold. We attribute the destabilizing affect of silica to its negatively charged surface at neutral pH that repels the hybridizing complementary DNA.
机译:随着DNA微阵列的广泛使用,将寡核苷酸序列固定在玻璃载体上是生物诊断和分子生物学领域的中心。然而,由于与监测该掩埋界面有关的困难,对限制对固定在二氧化硅上的DNA的行为的影响尚不十分了解。二次谐波产生(SHG)是一种固有的表面特定技术,使其非常适合观察绝缘体界面(如二氧化硅)上的过程。使用通用的3-硝基吡咯核苷酸作为SHG活性标记,我们监测了固定在二氧化硅/水界面上的15-mer DNA的杂交速率和热解离。固定化的DNA在微小的时间尺度上显示出杂交速率,这比溶液中的杂交动力学要慢得多,但与在电化学界面上观察到的杂交行为相当。相反,固定在二氧化硅上的DNA的热解离温度比溶液中类似的双链体平均低12℃,这比在其他表面(如金)上观察到的温度高得多。我们将二氧化硅的不稳定作用归因于其在中性pH下带负电荷的表面,从而排斥了杂交互补DNA。

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