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Substrates for direct imaging of chemically functionalized SiO2 surfaces by transmission electron microscopy

机译:通过透射电子显微镜对化学功能化的SiO2表面进行直接成像的基材

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摘要

A significant challenge in materials characterization is the determination of the structure of nanoparticle assemblies that have been deposited on solid substrates, such as SiO2. The best method for obtaining quantitative information about structure, size, and spacing on the nanometerlength scale is TEM; however, commercially available TEM grids offer a limited range of substrate materials. In addition, die compositions of these grids do not permit much chemical processing. Here we describe silicon-based grids with electron-transparent SiO2 windows suitable for use as substrates for high-resolution TEM that can be easily fabricated using standard silicon microfabrication techniques. These grids are physically and chemically robust and exhibit the same surface chemistry and chemical stability as an oxide grown on a silicon wafer. Thus, the grids make possible the concurrent investigation of chemical and structural information on the same sample. Convenient modification of the surfaces of the grids provides access to a wide range of new substrates for the direct imaging of chemically modified surfaces by TEM. We demonstrate the utility of these grids by aligning DNA on the chemically modified SiO2 surface in order to direct the assembly of linear arrays of nanoparticles. Using these grids, we are able to quantify the effects of assembly conditions on nanoparticle size, spacing, and dispersity in the arrays.
机译:材料表征方面的重大挑战是确定已沉积在固体基材(例如SiO2)上的纳米颗粒组件的结构。获得有关纳米级尺度上的结构,尺寸和间距的定量信息的最佳方法是TEM。但是,市售的TEM栅格只能提供有限范围的基材。另外,这些格栅的模具组成不允许进行太多的化学处理。在这里,我们描述了具有电子透明SiO2窗口的硅基栅格,该栅格适合用作高分辨率TEM的基板,可以使用标准的硅微制造技术轻松制造。这些栅格在物理和化学上都是坚固的,并且表现出与在硅晶片上生长的氧化物相同的表面化学和化学稳定性。因此,网格使同时研究同一样品的化学和结构信息成为可能。网格表面的方便修饰为通过TEM对化学修饰的表面进行直接成像提供了广泛的新基材。我们通过在化学修饰的SiO2表面上排列DNA以指示纳米颗粒线性阵列的组装,来证明这些网格的实用性。使用这些网格,我们能够量化组装条件对纳米颗粒尺寸,间距和阵列中分散度的影响。

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