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Rapid and high yield synthesis of hollow silica nanoparticles using an NH4F catalyst

机译:使用NH4F催化剂快速高效地合成空心二氧化硅纳米颗粒

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The rapid synthesis of hollow silica nanoparticles based on the CaC〇_3 template method is proposed. Typically, it contains two steps for the silica coating on a CaCO_3 template by a sol-gel reaction and template removal by a dilute acid solution. To promote the conversion of tetraethoxysilane (TEOS) to a silica shell on the CaCO_3 template, the effects of fluoride catalysts on the TEOS consumption rate during the silica coating were investigated using energy dispersive spectroscopy (EDS). The TEOS consumption rate of the NH4F-catalyzed system reached 100% within 15 min while the conventional NH_4OH system took 120 min to consume the TEOS. The obtained samples using the NH4F system for 15 min showed a uniform hollow structure with a thin silica shell. For the KF system as the other fluoride catalyst, the TEOS consumption rate did not reach 100% even after 120 min. When the polystyrene (PS) template was used with the NH4F system, dense silica particles were formed as well as hollow structures. Based on these results, a rapid and high yield of hollow silica nanoparticles can be achieved by not only F~-, but also NH_4~+ using the CaCO_3 template method.
机译:提出了一种基于CaC〇_3模板法的空心二氧化硅纳米粒子的快速合成方法。通常,它包含两个步骤,用于通过溶胶-凝胶反应在CaCO_3模板上进行二氧化硅涂层,以及通过稀酸溶液去除模板。为了促进四乙氧基硅烷(TEOS)在CaCO_3模板上转化为二氧化硅壳,使用能量分散光谱(EDS)研究了氟化物催化剂对二氧化硅涂覆过程中TEOS消耗速率的影响。 NH4F催化体系的TEOS消耗率在15分钟内达到100%,而常规NH_4OH系统消耗TEOS则需要120分钟。使用NH4F系统15分钟获得的样品显示出具有薄硅壳的均匀空心结构。对于作为另一种氟化物催化剂的KF系统,即使在120分钟后,TEOS消耗率仍未达到100%。当将聚苯乙烯(PS)模板与NH4F系统一起使用时,会形成致密的二氧化硅颗粒以及中空结构。基于这些结果,不仅可以使用CaCO_3模板法通过F〜-,而且可以通过NH_4〜+实现高产率的空心二氧化硅纳米粒子。

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