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首页> 外文期刊>Carbon: An International Journal Sponsored by the American Carbon Society >Energy gap tunable graphene antidot nanoribbon MOSFET: A uniform multiscale analysis from band structure to transport properties
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Energy gap tunable graphene antidot nanoribbon MOSFET: A uniform multiscale analysis from band structure to transport properties

机译:能隙可调石墨烯解毒点纳米带MOSFET:从能带结构到传输特性的均匀多尺度分析

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摘要

A detailed simulation study of the graphene antidot nanoribbon (GANR) and its corresponding MOSFET characteristics is shown in this paper. The research uncovers that the GANR's energy gap (E-g) is continuously tunable by its topography parameters, such as the ribbon's width, the antidot density and the antidot size. At the same ribbon width, the E-g of GANR can be tuned flexibly, while it is only a fixed value in GNR. Owing to these flexible E-g regulations, device applications based on GANRs could be more widely used. Furthermore, brief compact descriptions are extracted between GANR's band gap and MOSFET's device characteristics. Using E-g as a bridge, the relations between the structure characteristics and transport properties of GANR MOSFETs are constructed directly. The results reveal that the antidot nanoribbon structure is a good candidate for MOSFET applications. In the calculation, an elaborate ab initio-based study framework from band structure to device performance is adopted. Using the maximally localized Wannier functions (MLWF) method, the impacts on band structures, which are induced by crystal optimizations, are reserved into the TB Hamiltonian without any parameter revisions. This method overcomes the gap between nano-scale carbon structures' material characteristics and their device applications. (C) 2016 Elsevier Ltd. All rights reserved.
机译:本文详细介绍了石墨烯解毒剂纳米带(GANR)及其相应的MOSFET特性的仿真研究。研究发现,GANR的能隙(E-g)可通过其形貌参数(例如色带的宽度,解毒点密度和解毒点大小)连续调节。在相同的色带宽度下,可以灵活地调整GANR的E-g,而在GNR中它只是一个固定值。由于这些灵活的E-g法规,基于GANR的设备应用程序可能会得到更广泛的应用。此外,在GANR的带隙和MOSFET的器件特性之间提取了简短的简短描述。以E-g为桥,可以直接构建GANR MOSFET的结构特性与传输特性之间的关系。结果表明,antidot纳米带结构是MOSFET应用的理想选择。在计算中,采用了从头到尾的详细研究框架,从频带结构到设备性能。使用最大局部Wannier函数(MLWF)方法,由晶体优化引起的对能带结构的影响被保留在TB哈密顿量中,而无需进行任何参数修改。该方法克服了纳米级碳结构的材料特性与其器件应用之间的空白。 (C)2016 Elsevier Ltd.保留所有权利。

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