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Kinetics of the self-reactions of benzyl and o-xylyl radicals studied by cavity ring-down spectroscopy

机译:腔衰荡光谱研究苄基和邻二甲苯基的自反应动力学

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The kinetics of the self-reactions of benzyl and o-xylyl radicals was studied experimentally over the temperature range 295-800 K. The radicals were produced by the 248-nm photolysis of oxalyl chloride followed by the H-abstraction reactions from toluene or o-xylene by Cl atoms and detected by cavity ring-down spectroscopy. The visible absorption cross sections of the radicals were determined relative to that of the HCO radical. The rate constants determined were k(benzyl + benzyl) = 1.29 × 10 ~(-3)T ~(-2.669)exp(-674/T) cm ~3 molecule ~(-1) s ~(-1) (Δlog _(10)k = ±0.096) and k(o-xylyl + o-xylyl) = 2.57T ~(-3.784)exp(-1025/T) cm ~3 molecule ~(-1) s ~(-1) (Δlog 10k = ± 0.107).
机译:在295-800 K的温度范围内,对苄基和邻二甲苯基自由基的自反应动力学进行了实验研究。这些自由基是通过248 nm草酰氯的光解以及随后的甲苯或邻苯的H吸收反应产生的-二甲苯通过Cl原子并通过腔衰荡光谱法检测。相对于HCO自由基确定了自由基的可见吸收截面。确定的速率常数为k(苄基+苄基)= 1.29×10〜(-3)T〜(-2.669)exp(-674 / T)cm〜3分子〜(-1)s〜(-1)(Δlog _(10)k =±0.096)和k(邻二甲苯基+邻二甲苯基)= 2.57T〜(-3.784)exp(-1025 / T)cm〜3分子〜(-1)s〜(-1) (Δlog10k =±0.107)。

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