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Nucleotide Excision Repair of Chemically Stabilized Analogues of DNA Interstrand Cross-Links Produced from Oxidized Abasic Sites

机译:从氧化的无碱基位点产生的DNA链间化学键的化学稳定类似物的核苷酸切除修复。

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Nucleotide excision repair is a primary pathway in cells for coping with DNA interstrand cross-links (ICLs). Recently, C4'-oxidized (C4-AP) and C5'-oxidized abasic sites (DOB) that are produced following hydrogen atom abstraction from the DNA backbone were found to produce ICLs. Because some of the ICLs derived from C4-AP and DOB are too unstable to characterize in biochemical processes, chemically stable analogues were synthesized [Ghosh, S., and Greenberg, M. M. (2014) J. Org. Chem. 79, 5948-5957]. UvrABC incision of DNA substrates containing stabilized analogues of the ICLs derived from C4-AP and DOB was examined. The incision pattern for the ICL related to the C4'-oxidized abasic site was typical for UvrABC substrates. UvrABC cleaved both strands of the substrate containing the C4-AP ICL analogue, but it was a poor substrate. UvrABC incised <30% of the C4-AP ICL analogue over an 8 h period, raising the possibility that this cross-link will be inefficiently repaired in cells. Furthermore, double-strand breaks were not detected upon incision of an internally labeled hairpin substrate containing the C4-AP ICL analogue. UvrABC incised the stabilized analogue of the DOB ICL more efficiently (~20% in 1 h). Furthermore, the incision pattern was unique, and the cross-linked substrate was converted into a single product, a double-strand break. The template strand was exclusively incised on the template strand on the 3'-side of the cross-linked dA. Although the outcomes of the interaction between UvrABC and these two cross-linked substrates are different from one another, they provide additional examples of how seemingly simple lesions (C4-AP and DOB) can potentially exert significant deleterious effects on biochemical processes.
机译:核苷酸切除修复是细胞中应对DNA链间交联(ICL)的主要途径。最近,发现从DNA主链提取氢原子后产生的C4'氧化(C4-AP)和C5'氧化的无碱基位点(DOB)产生了ICL。由于衍生自C4-AP和DOB的某些ICL太不稳定,无法在生化过程中表征,因此合成了化学稳定的类似物[Ghosh,S.,and Greenberg,M.M.(2014)J.Org。化学79,5948-5957]。检查了含有来自C4-AP和DOB的ICL的稳定类似物的DNA底物的UvrABC切口。与C4'氧化的无碱基位点相关的ICL切口模式是UvrABC底物的典型特征。 UvrABC裂解了含有C4-AP ICL类似物的底物的两条链,但底物较差。 UvrABC在8小时内切割了不到30%的C4-AP ICL类似物,从而提高了这种交联在细胞中修复效率低下的可能性。此外,切开内部标记的含有C4-AP ICL类似物的发夹底物时未检测到双链断裂。 UvrABC更有效地切割了DOB ICL的稳定类似物(1小时内约20%)。此外,切口图案是独特的,并且将交联的基材转变成单一产品,即双链断裂。模板链仅在交联的dA的3'侧切在模板链上。尽管UvrABC与这两种交联底物之间相互作用的结果彼此不同,但它们提供了看似简单的病变(C4-AP和DOB)如何可能对生化过程产生重大有害影响的其他示例。

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