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Electrical properties of BLT thin films prepared by CSD (chemical solution deposition) method

机译:通过CSD(化学溶液沉积)方法制备的BLT薄膜的电性能

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摘要

Recently, the ferroelectrics bismuth lanthanum titanate (Bi{sub}3.25La{sub}0.75Ti{sub}3O{sub}12) thin film has been expected as a novel material for FRAM device since it has a large polarization, fatigue free, and crystallized at low temperature compared to SrBi{sub}2Ta{sub}2O{sub}9 material. The BLT thin film was fabricated successfully on Pt/Ti/SiO{sub}2/Si substrate by chemical solution deposition method. The films were crystallized at the temperature range of 600~700℃ using rapid thermal process and quartz tube furnace. X-ray diffraction shows a ferroelectric single-phase film. The spontaneous polarization (Ps) and the switching polarization of BLT film annealed at 700℃ for 2 min are 16.75 and 13.14 uC/cm{sup}2, respectively.
机译:最近,由于铁电性钛酸铋铋(Bi {sub} 3.25La {sub} 0.75Ti {sub} 3O {sub} 12)薄膜具有大的极化,无疲劳,与SrBi {sub} 2Ta {sub} 2O {sub} 9材料相比,在低温下结晶。采用化学溶液沉积法在Pt / Ti / SiO {sub} 2 / Si衬底上成功制备了BLT薄膜。使用快速热处理和石英管炉在600〜700℃的温度范围内将薄膜结晶。 X射线衍射显示出铁电单相膜。 700℃退火2 min的BLT薄膜的自发极化(Ps)和转换极化分别为16.75和13.14 uC / cm {sup} 2。

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