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Influence of FeTiO3 Formation on Photocatalytic Property of Plasma Sprayed TiO2 Coatings

机译:FeTiO3的形成对等离子喷涂TiO2涂层光催化性能的影响

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摘要

To inhibit the rapid recombination of excited electrons and holes in photocatalysis, the p-n junction was formed by plasma spraying TiO2-Fe3O4 composite powders. The microstructure, morphology and composition of the sprayed coating and splat were analyzed using electron probe surface roughness analyzer (ERA-8800FE), energy dispersive analysis of X-ray (EDAX) and X-ray diffraction. The results showed that the n-type TiO2 semiconductor particle reacted with Fe3O4 particle and concurrently produced p-type FeTiO3, and consequently formed p-n junction in the interface between the TiO2 lamella and FeTiO3 compound. This phenomenon was clearly proved by photocurrent-potential measurement and line analysis results. For the formation of micro p-n junction, the photocatalytic activity of TiO2-Fe3O4 coating was approximately two times higher than that of T1O2 coating. From these investigations, a promising approach for manufacturing high performance photocatalytic coating by plasma spraying was suggested.
机译:为了抑制光催化过程中激发电子和空穴的快速复合,通过等离子喷涂TiO2-Fe3O4复合粉末形成p-n结。使用电子探针表面粗糙度分析仪(ERA-8800FE),X射线能量色散分析(EDAX)和X射线衍射分析喷涂的涂层和splat的微观结构,形态和成分。结果表明,n型TiO2半导体颗粒与Fe3O4颗粒发生反应,同时生成p型FeTiO3,从而在TiO2薄片与FeTiO3化合物的界面上形成p-n结。光电流电位测量和线分析结果清楚地证明了这一现象。为了形成微p-n结,TiO2-Fe3O4涂层的光催化活性大约是TiO2涂层的光催化活性的两倍。从这些研究中,提出了一种通过等离子体喷涂制造高性能光催化涂层的有前途的方法。

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